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author:

Lin, Heng (Lin, Heng.) [1] | Zheng, Yueting (Zheng, Yueting.) [2] | Zhong, Chao (Zhong, Chao.) [3] | Lin, Lihua (Lin, Lihua.) [4] (Scholars:林立华) | Yang, Kaiyu (Yang, Kaiyu.) [5] (Scholars:杨开宇) | Liu, Yang (Liu, Yang.) [6] | Hu, Hailong (Hu, Hailong.) [7] (Scholars:胡海龙) | Li, Fushan (Li, Fushan.) [8] (Scholars:李福山)

Indexed by:

EI SCIE

Abstract:

Preparation of high-quality functional films with nanoscale thickness and tunable layers is highly preferable and indispensable for optoelectronic applications, and has drawn enormous attention from research communities. Constructing dense self-assembled monolayer films is an ideal route to realize highly ordered functional films of optoelectronic devices. Moreover, the self-assembly technique can be used to construct elaborated micro/nanoarchitecture for multifunctional and integrated devices by further incorporating patterning methods. A review bridging the controllable-assembled-monolayer technique and functional optoelectronic devices is highly desirable, which would boost the device's performance and even enable emerging applications like ultrahigh-resolution devices. Here we overview the primary mechanism, material systems, transfer methods, and device applications of the controllable-assembled-monolayers. We highlight the high-quality quasi-lattice monolayer films and corresponding potential optoelectronic applications. A systematic review of the controllable-assembled-monolayer technique will help further our understanding of its potential in constructing functional films and optoelectronic devices. Systematic review of the application of controllable assembled LB films in combination with optoelectronic applications.

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Community:

  • [ 1 ] [Lin, Heng]Fuzhou Univ, Inst Optoelect Technol, Fuzhou 350116, Peoples R China
  • [ 2 ] [Zheng, Yueting]Fuzhou Univ, Inst Optoelect Technol, Fuzhou 350116, Peoples R China
  • [ 3 ] [Zhong, Chao]Fuzhou Univ, Inst Optoelect Technol, Fuzhou 350116, Peoples R China
  • [ 4 ] [Lin, Lihua]Fuzhou Univ, Inst Optoelect Technol, Fuzhou 350116, Peoples R China
  • [ 5 ] [Yang, Kaiyu]Fuzhou Univ, Inst Optoelect Technol, Fuzhou 350116, Peoples R China
  • [ 6 ] [Hu, Hailong]Fuzhou Univ, Inst Optoelect Technol, Fuzhou 350116, Peoples R China
  • [ 7 ] [Li, Fushan]Fuzhou Univ, Inst Optoelect Technol, Fuzhou 350116, Peoples R China
  • [ 8 ] [Liu, Yang]Fujian Normal Univ, Strait Inst Flexible Elect SIFE, Future Technol, Fuzhou 350117, Peoples R China
  • [ 9 ] [Hu, Hailong]Innovat Lab Optoelect Informat China, Fujian Sci & Technol, Fuzhou 350100, Peoples R China
  • [ 10 ] [Li, Fushan]Innovat Lab Optoelect Informat China, Fujian Sci & Technol, Fuzhou 350100, Peoples R China

Reprint 's Address:

  • [Li, Fushan]Fuzhou Univ, Inst Optoelect Technol, Fuzhou 350116, Peoples R China;;[Liu, Yang]Fujian Normal Univ, Strait Inst Flexible Elect SIFE, Future Technol, Fuzhou 350117, Peoples R China;;[Li, Fushan]Innovat Lab Optoelect Informat China, Fujian Sci & Technol, Fuzhou 350100, Peoples R China;;

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Source :

JOURNAL OF MATERIALS CHEMISTRY C

ISSN: 2050-7526

Year: 2023

Issue: 4

Volume: 12

Page: 1177-1210

5 . 7

JCR@2023

5 . 7 0 0

JCR@2023

JCR Journal Grade:1

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count: 2

SCOPUS Cited Count: 2

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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