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author:

Yang, Kaiyu (Yang, Kaiyu.) [1] | Li, Fushan (Li, Fushan.) [2] | Hu, Hailong (Hu, Hailong.) [3] | Guo, Tailiang (Guo, Tailiang.) [4] | Kim, Tae Whan (Kim, Tae Whan.) [5]

Indexed by:

EI

Abstract:

Perovskite light-emitting diodes (PeLEDs) have been intensively researched in recent years, and their rapid evolution of efficiency has resulted in their becoming a member of the family of devices with external quantum efficiencies (EQEs) > 20%. In this evolution process, surface engineering was found to be a key factor for obtaining the high-efficiency PeLEDs because of its effects on the state and the density of charge carriers, the density of defects, the transport and the injection of charge, etc. In this review, we mainly focus on recent works on highly efficient PeLEDs based on perovskite 3D/quasi-2D/quantum dots and try to discover the reasons behind their high performance. With continuous optimization of materials and devices, especially with surface engineering, the efficiency of PeLEDs is expected to continue growing and to reach an exciting new level in the near future. © 2019

Keyword:

Carrier mobility Diodes Efficiency Graphene quantum dots Lead compounds Light emitting diodes Optimization Perovskite Quantum efficiency Semiconductor quantum dots

Community:

  • [ 1 ] [Yang, Kaiyu]Institute of Optoelectronic Technology, Fuzhou University, Fuzhou; 350116, China
  • [ 2 ] [Li, Fushan]Institute of Optoelectronic Technology, Fuzhou University, Fuzhou; 350116, China
  • [ 3 ] [Hu, Hailong]Institute of Optoelectronic Technology, Fuzhou University, Fuzhou; 350116, China
  • [ 4 ] [Guo, Tailiang]Institute of Optoelectronic Technology, Fuzhou University, Fuzhou; 350116, China
  • [ 5 ] [Kim, Tae Whan]Department of Electronic Engineering, Hanyang University, Seoul; 133-791, Korea, Republic of

Reprint 's Address:

  • [kim, tae whan]department of electronic engineering, hanyang university, seoul; 133-791, korea, republic of

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Source :

Nano Energy

ISSN: 2211-2855

Year: 2019

Volume: 65

1 6 . 6 0 2

JCR@2019

1 6 . 8 0 0

JCR@2023

ESI HC Threshold:236

JCR Journal Grade:1

CAS Journal Grade:1

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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