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Fabrication of Super Uniform Nickel Bumps Using Electroless Plating on Micro-LEDs’ TFT Driver Substrates

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author:

Wang, S. (Wang, S..) [1] | Lin, C. (Lin, C..) [2] | Lu, Y. (Lu, Y..) [3] | Unfold

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Scopus

Abstract:

In this study, in order to achieve high-yield Micro-LED chip bonding and thus further advance the breakthrough of Micro- LED interconnect technology. In this study, an electroless plating method is used to achieve the highly uniform nickel bump arrays on thin film transistor (TFT) driver substrate. Initially, the photoresists AZ4620 and AZ2070 are chosen for the experiments, which can cover the step structure uniformly of TFT substrate. Subsequently, the morphology of bumps on the TFT substrate influenced by the plasma treatment and the deposition time is investigated. The 1% uniformity of the nickel bump arrays by the electroless plating for 30 minutes after 5-minute plasma treatment is achieved, which lays the foundation for the electroless plating self-bonding. © 2024 John Wiley and Sons Inc. All rights reserved.

Keyword:

Electroless Plating: Nickel Bump Highly Uniform Micro-LED

Community:

  • [ 1 ] [Wang S.]National and Local United Engineering Laboratory of Flat Panel Display Technology, Fuzhou University, Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, 350100, China
  • [ 2 ] [Lin C.]National and Local United Engineering Laboratory of Flat Panel Display Technology, Fuzhou University, Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, 350100, China
  • [ 3 ] [Lu Y.]National and Local United Engineering Laboratory of Flat Panel Display Technology, Fuzhou University, Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, 350100, China
  • [ 4 ] [Sun J.]National and Local United Engineering Laboratory of Flat Panel Display Technology, Fuzhou University, Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, 350100, China
  • [ 5 ] [Sun J.]Quantum Device Physics Laboratory, Department of Microscience and Nanotechnology, Chalmers University of Technology, Göteborg, Sweden
  • [ 6 ] [Yan Q.]National and Local United Engineering Laboratory of Flat Panel Display Technology, Fuzhou University, Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, 350100, China
  • [ 7 ] [Zhang K.]National and Local United Engineering Laboratory of Flat Panel Display Technology, Fuzhou University, Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, 350100, China
  • [ 8 ] [Huang Z.]National and Local United Engineering Laboratory of Flat Panel Display Technology, Fuzhou University, Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, 350100, China
  • [ 9 ] [Yang T.]National and Local United Engineering Laboratory of Flat Panel Display Technology, Fuzhou University, Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, 350100, China
  • [ 10 ] [Guo T.]National and Local United Engineering Laboratory of Flat Panel Display Technology, Fuzhou University, Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, 350100, China

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ISSN: 0097-966X

Year: 2024

Issue: S1

Volume: 55

Page: 194-196

Language: English

Cited Count:

WoS CC Cited Count:

30 Days PV: 1

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