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author:

Shen, Yiwei (Shen, Yiwei.) [1] | Li, Wenhao (Li, Wenhao.) [2] | Wang, Kun (Wang, Kun.) [3] | Chen, Rong (Chen, Rong.) [4] | Wu, Chaoxing (Wu, Chaoxing.) [5] (Scholars:吴朝兴) | Zhou, Xiongtu (Zhou, Xiongtu.) [6] (Scholars:周雄图) | Zhang, Yongai (Zhang, Yongai.) [7] (Scholars:张永爱) | Xiao, Yin (Xiao, Yin.) [8] | Zhao, Suling (Zhao, Suling.) [9] | Guo, Tailiang (Guo, Tailiang.) [10] (Scholars:郭太良)

Indexed by:

EI Scopus SCIE

Abstract:

Quantum dot (QD) light-emitting devices operating in non-carrier -injection (NCI) mode have attracted intense interest. Revealing the source of carriers that support the periodic electroluminescence is important because there is no injection of carriers from the external electrode. Electrons/holes generated by well-to-well multiple ionization in adjacent QDs are generally recognized as the carrier source for electroluminescence, and the stacked QD layers are necessary. In this work, NCI electroluminescence (NCI-EL) from monolayer QDs is successfully demonstrated, which cannot be properly explained by the previously proposed mechanism of multiple ionization. A working mechanism related to periodic in-well ionization is proposed, in which electrons tunnel directly from the valence band of QDs to the conduction band to form free electrons and holes. The effects of driving voltage amplitude, frequency, and QD size on the NCI-EL performance are investigated. Finite element simulation is used to clarify the ionization process. We believe this work can extend the working mechanism model of NCI-EL from QDs and provide guidance for promoting QD-based light-emitting device performance.

Keyword:

Community:

  • [ 1 ] [Shen, Yiwei]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350108, Peoples R China
  • [ 2 ] [Li, Wenhao]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350108, Peoples R China
  • [ 3 ] [Wang, Kun]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350108, Peoples R China
  • [ 4 ] [Wu, Chaoxing]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350108, Peoples R China
  • [ 5 ] [Zhou, Xiongtu]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350108, Peoples R China
  • [ 6 ] [Zhang, Yongai]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350108, Peoples R China
  • [ 7 ] [Guo, Tailiang]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350108, Peoples R China
  • [ 8 ] [Chen, Rong]Fujian Sci & Technol Innovat Lab Optoelect Informa, Fuzhou 350108, Peoples R China
  • [ 9 ] [Wu, Chaoxing]Fujian Sci & Technol Innovat Lab Optoelect Informa, Fuzhou 350108, Peoples R China
  • [ 10 ] [Zhou, Xiongtu]Fujian Sci & Technol Innovat Lab Optoelect Informa, Fuzhou 350108, Peoples R China
  • [ 11 ] [Zhang, Yongai]Fujian Sci & Technol Innovat Lab Optoelect Informa, Fuzhou 350108, Peoples R China
  • [ 12 ] [Guo, Tailiang]Fujian Sci & Technol Innovat Lab Optoelect Informa, Fuzhou 350108, Peoples R China
  • [ 13 ] [Xiao, Yin]Tianjin Univ, Sch Chem Engn & Technol, Tianjin 300350, Peoples R China
  • [ 14 ] [Zhao, Suling]Beijing Jiaotong Univ, Inst Optoelect Technol, Key Lab Luminescence & Opt Informat, Minist Educ, Beijing 100044, Peoples R China

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Source :

JOURNAL OF PHYSICAL CHEMISTRY LETTERS

ISSN: 1948-7185

Year: 2022

Issue: 45

Volume: 13

Page: 10649-10655

5 . 7

JCR@2022

4 . 9 0 0

JCR@2023

ESI Discipline: CHEMISTRY;

ESI HC Threshold:74

JCR Journal Grade:1

CAS Journal Grade:1

Cited Count:

WoS CC Cited Count: 14

SCOPUS Cited Count: 10

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 2

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