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author:

Xu, Hao (Xu, Hao.) [1] | Guo, Weiling (Guo, Weiling.) [2] | Deng, Jie (Deng, Jie.) [3] | Chen, Jiaxin (Chen, Jiaxin.) [4] | Miao, Hui (Miao, Hui.) [5] | Sun, Jie (Sun, Jie.) [6] (Scholars:孙捷)

Indexed by:

EI Scopus SCIE

Abstract:

In this paper, a novel kind of GaN light-emitting diode (LED) with P and N discontinuous ohmic contact electrodes and discontinuous current blocking layer (CBL) is designed and prepared. Multiple contact windows under the N- and P-electrodes formed by etching help realize the discontinuous ohmic contacts with the N-GaN layer and the ITO layer, respectively. Similarly, by etching a plurality of discontinuous openings with the same pitch in the CBL, a discontinuous CBL structure is formed. As compared with traditional structures, the discontinuous ohmic contacts can maximize the number of current paths which allow the carriers to be collected from all four directions, leading to a more uniform current spreading and thermal management. Furthermore, as the contacts are not continuous any longer, some of the otherwise removed materials (such as the active region) lying between the patches are saved. The optoelectronic characteristics, junction temperature, thermal resistance, and infrared thermography measurements are conducted and the current distribution is simulated. The results show that the novel LED structure has better optoelectronic performances and current spreading ability compared to traditional devices. At 150 mA current, the luminous efficiency is 15.2% higher than the traditional LED, the junction temperature is reduced by 4.9%, and the thermal resistance is reduced by 12%.

Keyword:

current spreading discontinuous ohmic contact electrodes Electrodes GaN LEDs Licenses Light emitting diodes Ohmic contacts Temperature distribution Temperature measurement thermal management Thermal resistance

Community:

  • [ 1 ] [Xu, Hao]Beijing Univ Technol, Key Lab Optoelect Technol, Pingleyuan Beijing 100124, Peoples R China
  • [ 2 ] [Guo, Weiling]Beijing Univ Technol, Key Lab Optoelect Technol, Pingleyuan Beijing 100124, Peoples R China
  • [ 3 ] [Deng, Jie]Beijing Univ Technol, Key Lab Optoelect Technol, Pingleyuan Beijing 100124, Peoples R China
  • [ 4 ] [Chen, Jiaxin]Beijing Univ Technol, Key Lab Optoelect Technol, Pingleyuan Beijing 100124, Peoples R China
  • [ 5 ] [Miao, Hui]Beijing Univ Technol, Key Lab Optoelect Technol, Pingleyuan Beijing 100124, Peoples R China
  • [ 6 ] [Sun, Jie]Fuzhou Univ, Fujian Sci & Technol Innovat Lab Optoelect Inform, Fuzhou 350100, Peoples R China
  • [ 7 ] [Sun, Jie]Fuzhou Univ, Natl & Local United Engn Lab Flat Panel Display T, Fuzhou 350100, Peoples R China

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Source :

IEEE PHOTONICS JOURNAL

ISSN: 1943-0655

Year: 2022

Issue: 3

Volume: 14

2 . 4

JCR@2022

2 . 1 0 0

JCR@2023

ESI Discipline: PHYSICS;

ESI HC Threshold:55

JCR Journal Grade:3

CAS Journal Grade:4

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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