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author:

Xu, Hao (Xu, Hao.) [1] | Guo, Weiling (Guo, Weiling.) [2] | Deng, Jie (Deng, Jie.) [3] | Chen, Jiaxin (Chen, Jiaxin.) [4] | Miao, Hui (Miao, Hui.) [5] | Sun, Jie (Sun, Jie.) [6]

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EI

Abstract:

In this paper, a novel kind of GaN light-emitting diode (LED) with P and N discontinuous ohmic contact electrodes and discontinuous current blocking layer (CBL) is designed and prepared. Multiple contact windows under the N- and P-electrodes formed by etching help realize the discontinuous ohmic contacts with the N-GaN layer and the ITO layer, respectively. Similarly, by etching a plurality of discontinuous openings with the same pitch in the CBL, a discontinuous CBL structure is formed. As compared with traditional structures, the discontinuous ohmic contacts can maximize the number of current paths which allow the carriers to be collected from all four directions, leading to a more uniform current spreading and thermal management. Furthermore, as the contacts are not continuous any longer, some of the otherwise removed materials (such as the active region) lying between the patches are saved. The optoelectronic characteristics, junction temperature, thermal resistance, and infrared thermography measurements are conducted and the current distribution is simulated. The results show that the novel LED structure has better optoelectronic performances and current spreading ability compared to traditional devices. At 150 mA current, the luminous efficiency is 15.2% higher than the traditional LED, the junction temperature is reduced by 4.9%, and the thermal resistance is reduced by 12%. © 2009-2012 IEEE.

Keyword:

Electric contactors Electrodes Etching Gallium nitride III-V semiconductors Light emitting diodes Ohmic contacts Temperature control Temperature measurement

Community:

  • [ 1 ] [Xu, Hao]Beijing University of Technology, Key Laboratory of Optoelectronics Technology, Beijing; 100124, China
  • [ 2 ] [Guo, Weiling]Beijing University of Technology, Key Laboratory of Optoelectronics Technology, Beijing; 100124, China
  • [ 3 ] [Deng, Jie]Beijing University of Technology, Key Laboratory of Optoelectronics Technology, Beijing; 100124, China
  • [ 4 ] [Chen, Jiaxin]Beijing University of Technology, Key Laboratory of Optoelectronics Technology, Beijing; 100124, China
  • [ 5 ] [Miao, Hui]Beijing University of Technology, Key Laboratory of Optoelectronics Technology, Beijing; 100124, China
  • [ 6 ] [Sun, Jie]Fuzhou University, Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China, National and Local United Engineering Laboratory of Flat Panel Display Technology, Fuzhou; 350100, China

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Source :

IEEE Photonics Journal

Year: 2022

Issue: 3

Volume: 14

2 . 4

JCR@2022

2 . 1 0 0

JCR@2023

ESI HC Threshold:55

JCR Journal Grade:3

CAS Journal Grade:4

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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