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[期刊论文]

Carrier Transport in Volatile Memory Device with SnO2 Quantum Dots Embedded in a Polyimide Layer

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author:

Wu, Chaoxing (Wu, Chaoxing.) [1] (Scholars:吴朝兴) | Li, Fushan (Li, Fushan.) [2] (Scholars:李福山) | Guo, Tailiang (Guo, Tailiang.) [3] (Scholars:郭太良) | Unfold

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Abstract:

Carrier transport in a volatile memory device utilizing self-assembled tin dioxide quantum dots (SnO2 QDs) embedded in a polyimide (PI) layer was investigated. Current-voltage (I-V) curves showed that the Ag/PI/SnO2 QDs/PI/indium-tin-oxide (ITO) device memory device had the ability to write, read, and refresh the electric states under various bias voltages. The capacitance-voltage (C-V) curve for Ag/PI/SnO2 QDs/PI/ p-Si capacitor exhibited a counterclockwise hysteresis, indicative of the existence of sites occupied by carriers. The origin of the volatile memory effect was attributed to holes trapping in the shallow traps formed between QD and PI matrix, which determines the carrier transport characteristics in the hybrid memory device. (C) 2011 The Japan Society of Applied Physics

Community:

  • [ 1 ] [Wu, Chaoxing]Fuzhou Univ, Inst Optoelect Display, Fuzhou 350002, Peoples R China
  • [ 2 ] [Li, Fushan]Fuzhou Univ, Inst Optoelect Display, Fuzhou 350002, Peoples R China
  • [ 3 ] [Guo, Tailiang]Fuzhou Univ, Inst Optoelect Display, Fuzhou 350002, Peoples R China
  • [ 4 ] [Kim, Tae Whan]Hanyang Univ, Dept Elect & Comp Engn, Seoul 133791, South Korea

Reprint 's Address:

  • 吴朝兴

    [Wu, Chaoxing]Fuzhou Univ, Inst Optoelect Display, Fuzhou 350002, Peoples R China

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Source :

JAPANESE JOURNAL OF APPLIED PHYSICS

ISSN: 0021-4922

Year: 2011

Issue: 9

Volume: 50

1 . 0 5 8

JCR@2011

1 . 5 0 0

JCR@2023

ESI Discipline: PHYSICS;

JCR Journal Grade:3

Cited Count:

WoS CC Cited Count:

30 Days PV: 0

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