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author:

Wu, Chaoxing (Wu, Chaoxing.) [1] (Scholars:吴朝兴) | Li, Fushan (Li, Fushan.) [2] (Scholars:李福山) | Chen, Wei (Chen, Wei.) [3] (Scholars:陈伟) | Veeramalai, Chandrasekar Perumal (Veeramalai, Chandrasekar Perumal.) [4] | Ooi, Poh Choon (Ooi, Poh Choon.) [5] | Guo, Tailiang (Guo, Tailiang.) [6] (Scholars:郭太良)

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Scopus SCIE

Abstract:

The direct observation of single crystal graphene growth and its shape evolution is of fundamental importance to the understanding of graphene growth physicochemical mechanisms and the achievement of wafer-scale single crystalline graphene. Here we demonstrate the controlled formation of single crystal graphene with varying shapes, and directly observe the shape evolution of single crystal graphene by developing a localized-heating and rapid-quenching chemical vapor deposition (CVD) system based on electromagnetic induction heating. Importantly, rational control of circular, hexagonal, and dendritic single crystalline graphene domains can be readily obtained for the first time by changing the growth condition. Systematic studies suggest that the graphene nucleation only occurs during the initial stage, while the domain density is independent of the growth temperatures due to the surface-limiting effect. In addition, the direct observation of graphene domain shape evolution is employed for the identification of competing growth mechanisms including diffusion-limited, attachment-limited, and detachment-limited processes. Our study not only provides a novel method for morphology-controlled graphene synthesis, but also offers fundamental insights into the kinetics of single crystal graphene growth.

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Community:

  • [ 1 ] [Wu, Chaoxing]Fuzhou Univ, Inst Optoelect Technol, Fuzhou 350002, Peoples R China
  • [ 2 ] [Li, Fushan]Fuzhou Univ, Inst Optoelect Technol, Fuzhou 350002, Peoples R China
  • [ 3 ] [Chen, Wei]Fuzhou Univ, Inst Optoelect Technol, Fuzhou 350002, Peoples R China
  • [ 4 ] [Veeramalai, Chandrasekar Perumal]Fuzhou Univ, Inst Optoelect Technol, Fuzhou 350002, Peoples R China
  • [ 5 ] [Ooi, Poh Choon]Fuzhou Univ, Inst Optoelect Technol, Fuzhou 350002, Peoples R China
  • [ 6 ] [Guo, Tailiang]Fuzhou Univ, Inst Optoelect Technol, Fuzhou 350002, Peoples R China

Reprint 's Address:

  • 李福山

    [Li, Fushan]Fuzhou Univ, Inst Optoelect Technol, Fuzhou 350002, Peoples R China

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Source :

SCIENTIFIC REPORTS

ISSN: 2045-2322

Year: 2015

Volume: 5

5 . 2 2 8

JCR@2015

3 . 8 0 0

JCR@2023

ESI Discipline: MULTIDISCIPLINARY;

ESI HC Threshold:500

JCR Journal Grade:1

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count: 22

SCOPUS Cited Count: 26

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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