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author:

Jia, H. (Jia, H..) [1] | Zhang, H. (Zhang, H..) [2] (Scholars:张红) | Cheng, S. (Cheng, S..) [3] (Scholars:程树英) | Yu, J. (Yu, J..) [4] (Scholars:俞金玲) | Lai, Y. (Lai, Y..) [5] (Scholars:赖云锋)

Indexed by:

EI Scopus SCIE

Abstract:

Cu2SnS3 (CTS) thin films were grown by sulfurization of vacuum thermal evaporated Sn-Cu metallic precursors in a H2S:N-2 atmosphere. Different Cu/Sn composition ratios of the films were prepared to study the effect of Cu/Sn atomic ratio on the properties of the CTS thin films. The microstructures and Cu/Sn composition ratios of the films were characterized with X-ray diffraction and energy dispersive X-ray spectroscopy (EDS), respectively. The X-ray diffractograms show that the deposited films are exclusively oriented along the (111) direction. The optical absorption coefficient and band gap of the films were estimated by transmission and reflection spectra measured at room temperature. Highly crystallized p-type CTS thin films were achieved when the Cu/Sn ratio was about 2.0. They had high absorption coefficient of similar to 10(4) cm(-1), suitable carrier concentration similar to 10(17) cm(3), high mobility 10(0)cm(2)v(-1)s(-1) and narrow optical band gap similar to 0.9 eV. Therefore, CTS thin films are suitable as absorber materials of thin film solar cells.

Keyword:

Absorber layer Cu2SnS3 thin film Cu/Sn ratio p-type semiconductor Solar cell material Thermal evaporated Two-stage process

Community:

  • [ 1 ] [Cheng, S.]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350108, Peoples R China
  • [ 2 ] [Cheng, S.]Fuzhou Univ, Inst Micronano Devices & Solar Cells, Fuzhou 350108, Peoples R China
  • [ 3 ] [Cheng, S.]Jiangsu Collaborat Innovat Ctr Photovolat Sci & E, Changzhou 213164, Peoples R China

Reprint 's Address:

  • 程树英

    [Cheng, S.]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350108, Peoples R China

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Source :

JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS

ISSN: 1454-4164

Year: 2016

Issue: 9-10

Volume: 18

Page: 863-867

0 . 4 4 9

JCR@2016

0 . 6 0 0

JCR@2023

ESI Discipline: MATERIALS SCIENCE;

ESI HC Threshold:324

JCR Journal Grade:4

CAS Journal Grade:4

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 2

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