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[期刊论文]

Structural reconfiguration and stress relaxation in twisted epitaxial graphene by annealing

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author:

Hu, Hailong (Hu, Hailong.) [1] (Scholars:胡海龙) | Chen, Maosheng (Chen, Maosheng.) [2] | Zhu, Yangbin (Zhu, Yangbin.) [3] | Unfold

Indexed by:

EI Scopus SCIE

Abstract:

The possibility to engineer the van der Waals interactions between graphene layers is crucial for controlling the electronic properties. Using epitaxial graphene with preferential orientations grown on the C-face 6H-SiC as a prototype, we have addressed the annealed structural reconfiguration of graphene layer in view of the evolutions of surface ripples and relative rotation angle (RRA) between lattices. It was found that the heat treatment of graphene layers under vacuum deformed the arcuate ripple surface and subsequently split one ripple into parallel twin pleats, which drastically increased the strains in the films. The originally oriented graphene layers, with small RRA between adjacent layers, were rearranged by the annealing resulting in disordered orientations and larger RRA. After a sufficient annealing, the compressive stress stored in the films was well released to give undistorted graphene lattices. The vacuum annealing is an effective treatment for irreversibly relaxing the graphene structure.

Keyword:

epitaxial graphene preferential orientation relative rotation angle ripple split stress release vacuum annealing

Community:

  • [ 1 ] [Hu, Hailong]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350116, Fujian, Peoples R China
  • [ 2 ] [Chen, Maosheng]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350116, Fujian, Peoples R China
  • [ 3 ] [Zhu, Yangbin]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350116, Fujian, Peoples R China
  • [ 4 ] [Lin, Yong]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350116, Fujian, Peoples R China
  • [ 5 ] [Li, Fushan]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350116, Fujian, Peoples R China
  • [ 6 ] [Guo, Tailiang]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350116, Fujian, Peoples R China

Reprint 's Address:

  • 胡海龙 李福山

    [Hu, Hailong]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350116, Fujian, Peoples R China;;[Li, Fushan]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350116, Fujian, Peoples R China

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Source :

NANOTECHNOLOGY

ISSN: 0957-4484

Year: 2019

Issue: 4

Volume: 30

3 . 5 5 1

JCR@2019

2 . 9 0 0

JCR@2023

ESI Discipline: MATERIALS SCIENCE;

ESI HC Threshold:236

JCR Journal Grade:2

CAS Journal Grade:3

Cited Count:

WoS CC Cited Count: 1

SCOPUS Cited Count: 1

30 Days PV: 0

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