Giant　magnetostrictive　films　(GMFs)　of　TbDy-Fe　were　grown　on　cold　substrate　by　ion　beam　sputtering　(IBS)　of　target　of　(Tb-Dy)Fe,　prepared　by　vacuum　casting.　Influence　of　the　sputtering　orientation　(α　angle)　on　the　film　growth　and　characteristics　of　the　film　were　studied.　The　results　show　that　within　the　given　sputtering　angle,　compact　amorphous　TbDy-Fe　GMF　with　smooth　surface　and　high　interfacial　adhesion　can　be　easily　grown　and　that　as　a　changes　from　α1　to　α9　(at　an　interval　of　about　2　degree),　various　parameters,including　its　deposition　rate,　its　stoichiometry　and　its　magnetostrictive　coefficient　(λ),　all　vary　accordingly.　For　example,　at　a　sputtering　orientation　around　α6　the　deposition　maximizes;　at　about　α5　the　stoichiometry　of　the　film　is　the　most　close　to　that　of　the　target;　around　α4　the　parallel　component　of　magnetostrictive　coefficient,　λ//,　measure　by　Tam　method,　can　reach　970×10-6　and　710×10-6　in　a　high　and　low　field　of　0.57　T　and　0.25　T,　respectively.