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author:

Wei, Lin (Wei, Lin.) [1] | Shizhen, Huang (Shizhen, Huang.) [2] | Wenzhe, Chen (Wenzhe, Chen.) [3]

Indexed by:

EI Scopus CSCD

Abstract:

An MWCNT-doped (multi-walled carbon nanotube) SnO2 thin film NO2 gas sensor, prepared by radio frequency reactive magnetron sputtering, showed a high sensitivity to ultra-low concentrations of NO 2 in the parts per billion range. X-ray diffraction, X-ray photoelectron spectroscopy, and scanning electron microscopy (SEM) characterizations indicated that the MWCNTs were affected by the morphology of the SnO2 thin film and the particle size. The properties of the MWCNT-doped SnO2 sensor, such as sensitivity, selectivity, and response-recovery time, were investigated. Experimental results revealed that the MWCNT-doped SnO2 thin film sensor response to NO2 gas depended on the operating temperature, NO2 gas concentration, thermal treatment conditions, film thickness, and so on. The mechanism of the gas-sensing property of the MWCNT-doped Sn22 thin film sensor was investigated and showed that the improved gas-sensing performance should be attributed to the effects between MWCNTs (p-type) and SnO2 (n-type) semiconductors. © 2010 Chinese Institute of Electronics.

Keyword:

Carbon nanotubes Chemical sensors Gas detectors Gases Heat treatment Magnetrons Magnetron sputtering Multiwalled carbon nanotubes (MWCN) Nitrogen compounds Scanning electron microscopy Thin film devices Thin films Tin X ray photoelectron spectroscopy

Community:

  • [ 1 ] [Wei, Lin]College of Material Science and Engineering, Fuzhou University, Fuzhou 350002, China
  • [ 2 ] [Wei, Lin]College of Physics and Information Engineering, Fuzhou University, Fuzhou 350002, China
  • [ 3 ] [Wei, Lin]Fujian Key Laboratory of Microelectronics and Integrated Circuits, Fuzhou 350002, China
  • [ 4 ] [Shizhen, Huang]College of Material Science and Engineering, Fuzhou University, Fuzhou 350002, China
  • [ 5 ] [Shizhen, Huang]College of Physics and Information Engineering, Fuzhou University, Fuzhou 350002, China
  • [ 6 ] [Shizhen, Huang]Fujian Key Laboratory of Microelectronics and Integrated Circuits, Fuzhou 350002, China
  • [ 7 ] [Wenzhe, Chen]College of Material Science and Engineering, Fuzhou University, Fuzhou 350002, China

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Source :

Journal of Semiconductors

ISSN: 1674-4926

CN: 11-5781/TN

Year: 2010

Issue: 2

Volume: 31

4 . 8 0 0

JCR@2023

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count: 9

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 2

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