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author:

Liu, Yang (Liu, Yang.) [1] | Li, Fushan (Li, Fushan.) [2] (Scholars:李福山) | Xu, Zhongwei (Xu, Zhongwei.) [3] (Scholars:徐中炜) | Zheng, Congxiu (Zheng, Congxiu.) [4] | Guo, Tailiang (Guo, Tailiang.) [5] (Scholars:郭太良) | Xie, Xiangwei (Xie, Xiangwei.) [6] | Qian, Lei (Qian, Lei.) [7] | Fu, Dong (Fu, Dong.) [8] | Yan, Xiaolin (Yan, Xiaolin.) [9]

Indexed by:

EI Scopus SCIE

Abstract:

Quantum dot light emitting diodes (QLEDs) are increasingly attractive owing to their compatibility with the inkjet printing process and potential application in low-cost large-area full-color pixelated display. The strategy for controlling the morphology of the quantum dot layer is definitely critical for realizing all-solution processed QLEDs with high performance, which certainly requires in-depth thinking regarding the design of ink composition and their optimization in the printing process. Herein, by carefully controlling the quantum dot ink composition and physico-5 chemical properties, we demonstrate that the viscosity, contact angle, and the three-phase contact line moving would affect the final morphology of the quantum dot film formed by inkjet printing. We achieved coffee ring-free and low-roughness quantum dot film, and all-solution processed QLEDs with normal structure were fabricated for the first time. The devices have a low turn on voltage of 2.0 V, a luminance of 12100 cd/m(2) at the voltage of 12 V, and a maximum current efficiency of 4.44 cd/A at the luminance of 1974 cd/m(2), which is the best result to date for inkjet-printed red QLEDs. The results will pave the way for future application of inkjet printing in solution processed pixelated QLED display.

Keyword:

all-solution process coffee ring inkjet printing QLEDs quantum dots

Community:

  • [ 1 ] [Liu, Yang]Fuzhou Univ, Inst Optoelect Technol, Fuzhou 350002, Fujian, Peoples R China
  • [ 2 ] [Li, Fushan]Fuzhou Univ, Inst Optoelect Technol, Fuzhou 350002, Fujian, Peoples R China
  • [ 3 ] [Xu, Zhongwei]Fuzhou Univ, Inst Optoelect Technol, Fuzhou 350002, Fujian, Peoples R China
  • [ 4 ] [Zheng, Congxiu]Fuzhou Univ, Inst Optoelect Technol, Fuzhou 350002, Fujian, Peoples R China
  • [ 5 ] [Guo, Tailiang]Fuzhou Univ, Inst Optoelect Technol, Fuzhou 350002, Fujian, Peoples R China
  • [ 6 ] [Xie, Xiangwei]TCL Corperate Res, Shenzhen 518057, Peoples R China
  • [ 7 ] [Qian, Lei]TCL Corperate Res, Shenzhen 518057, Peoples R China
  • [ 8 ] [Fu, Dong]TCL Corperate Res, Shenzhen 518057, Peoples R China
  • [ 9 ] [Yan, Xiaolin]TCL Corperate Res, Shenzhen 518057, Peoples R China

Reprint 's Address:

  • 李福山

    [Li, Fushan]Fuzhou Univ, Inst Optoelect Technol, Fuzhou 350002, Fujian, Peoples R China

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Source :

ACS APPLIED MATERIALS & INTERFACES

ISSN: 1944-8244

Year: 2017

Issue: 30

Volume: 9

Page: 25506-25512

8 . 0 9 7

JCR@2017

8 . 5 0 0

JCR@2023

ESI Discipline: MATERIALS SCIENCE;

ESI HC Threshold:306

JCR Journal Grade:1

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count: 162

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 2

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