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author:

Xu, Xiaorui (Xu, Xiaorui.) [1] (Scholars:许晓锐) | Deng, Yicong (Deng, Yicong.) [2] | Li, Titao (Li, Titao.) [3] (Scholars:李悌涛) | Chen, Duanyang (Chen, Duanyang.) [4] | Wang, Fangzhou (Wang, Fangzhou.) [5] | Yu, Cheng (Yu, Cheng.) [6] | Qi, Hongji (Qi, Hongji.) [7] | Wang, Yang (Wang, Yang.) [8] | Zhang, Haizhong (Zhang, Haizhong.) [9] (Scholars:张海忠) | Lu, Xiaoqiang (Lu, Xiaoqiang.) [10] (Scholars:卢孝强)

Indexed by:

EI Scopus SCIE

Abstract:

In this Letter, a Ga2O3 vertical Schottky barrier diode (SBD) with self-aligned field plate and mesa termination is fabricated and studied. The combination of field plate and mesa termination can effectively make the electric field distribution uniform in the termination, and thus the proposed SBD features high breakdown voltage (BV). Moreover, to eliminate alignment deviation and simplify the fabrication process, a self-aligned etching process is developed. The experimental results show that a low specific on-resistance of 4.405 m Omegacm(2) and a high BV of 3113 V can be simultaneously derived on the proposed SBD, yielding a high power figure of merit of 2.2 GW/cm(2). Meanwhile, a considerably low forward voltage of 1.53 V at 100 A/cm(2) is also achieved, demonstrating the low conduction loss of the device.

Keyword:

Community:

  • [ 1 ] [Xu, Xiaorui]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350116, Peoples R China
  • [ 2 ] [Deng, Yicong]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350116, Peoples R China
  • [ 3 ] [Li, Titao]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350116, Peoples R China
  • [ 4 ] [Zhang, Haizhong]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350116, Peoples R China
  • [ 5 ] [Lu, Xiaoqiang]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350116, Peoples R China
  • [ 6 ] [Chen, Duanyang]Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Res Ctr Laser Crystal, Shanghai 201800, Peoples R China
  • [ 7 ] [Qi, Hongji]Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Res Ctr Laser Crystal, Shanghai 201800, Peoples R China
  • [ 8 ] [Wang, Fangzhou]Songshan Lake Mat Lab, Dongguan 523808, Peoples R China
  • [ 9 ] [Yu, Cheng]Songshan Lake Mat Lab, Dongguan 523808, Peoples R China
  • [ 10 ] [Wang, Yang]Songshan Lake Mat Lab, Dongguan 523808, Peoples R China

Reprint 's Address:

  • [Li, Titao]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350116, Peoples R China;;[Zhang, Haizhong]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350116, Peoples R China;;

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Source :

APPLIED PHYSICS LETTERS

ISSN: 0003-6951

Year: 2024

Issue: 2

Volume: 125

3 . 5 0 0

JCR@2023

CAS Journal Grade:3

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count: 5

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 6

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