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author:

Xu, X. (Xu, X..) [1] | Deng, Y. (Deng, Y..) [2] | Li, T. (Li, T..) [3] | Chen, D. (Chen, D..) [4] | Wang, F. (Wang, F..) [5] | Yu, C. (Yu, C..) [6] | Qi, H. (Qi, H..) [7] | Wang, Y. (Wang, Y..) [8] | Zhang, H. (Zhang, H..) [9] | Lu, X. (Lu, X..) [10]

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Abstract:

In this Letter, a Ga2O3 vertical Schottky barrier diode (SBD) with self-aligned field plate and mesa termination is fabricated and studied. The combination of field plate and mesa termination can effectively make the electric field distribution uniform in the termination, and thus the proposed SBD features high breakdown voltage (BV). Moreover, to eliminate alignment deviation and simplify the fabrication process, a self-aligned etching process is developed. The experimental results show that a low specific on-resistance of 4.405 mΩ·cm2 and a high BV of 3113 V can be simultaneously derived on the proposed SBD, yielding a high power figure of merit of 2.2 GW/cm2. Meanwhile, a considerably low forward voltage of 1.53 V at 100 A/cm2 is also achieved, demonstrating the low conduction loss of the device. © 2024 Author(s).

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  • [ 1 ] [Xu X.]College of Physics and Information Engineering, Fuzhou University, Fuzhou, 350116, China
  • [ 2 ] [Deng Y.]College of Physics and Information Engineering, Fuzhou University, Fuzhou, 350116, China
  • [ 3 ] [Li T.]College of Physics and Information Engineering, Fuzhou University, Fuzhou, 350116, China
  • [ 4 ] [Chen D.]Research Center of Laser Crystal, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai, 201800, China
  • [ 5 ] [Wang F.]Songshan Lake Materials Laboratory, Dongguan, 523808, China
  • [ 6 ] [Yu C.]Songshan Lake Materials Laboratory, Dongguan, 523808, China
  • [ 7 ] [Qi H.]Research Center of Laser Crystal, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai, 201800, China
  • [ 8 ] [Wang Y.]Songshan Lake Materials Laboratory, Dongguan, 523808, China
  • [ 9 ] [Zhang H.]College of Physics and Information Engineering, Fuzhou University, Fuzhou, 350116, China
  • [ 10 ] [Lu X.]College of Physics and Information Engineering, Fuzhou University, Fuzhou, 350116, China

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Source :

Applied Physics Letters

ISSN: 0003-6951

Year: 2024

Issue: 2

Volume: 125

3 . 5 0 0

JCR@2023

CAS Journal Grade:3

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WoS CC Cited Count:

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ESI Highly Cited Papers on the List: 0 Unfold All

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Chinese Cited Count:

30 Days PV: 3

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