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author:

Wang, Mengqiu (Wang, Mengqiu.) [1] | Song, Qianyu (Song, Qianyu.) [2] | Zheng, Lishuai (Zheng, Lishuai.) [3] | Hou, Linxi (Hou, Linxi.) [4]

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EI

Abstract:

The synthesis of a low dielectric constant polyimide (PI) with a polyhedral oligomeric silsesquioxane (POSS) cross-linked structure is presented. A non-planar conjugated diamine monomer (FSNH2) with two -CH=CH2 reactive groups was first synthesised in a two-step process, and then two polyimides were synthesized by PSS-Octavinyl (OVPOSS) substituted, FSNH2 and dianhydride. OVPOSS cross-linked polyimides have good thermal stability and low dielectric constant. 6FDA-FSNH2-OVPOSS(6FPI-3) can reach a minimum dielectric constant of 2.08 (108 Hz) and a dielectric loss of 0.008 (108 Hz). In addition, the cross-linked structure of the OVPOSS and polyimide chains prevents the agglomeration of OVPOSS to a certain extent and improves the tensile strength and elongation at break of the polyimides, which has great application potential in large-scale integrated circuits. © The Author(s) 2023.

Keyword:

Amines Dielectric losses Oligomers Polyimides Tensile strength

Community:

  • [ 1 ] [Wang, Mengqiu]College of Chemical Engineering, Fuzhou University, Fuzhou, China
  • [ 2 ] [Wang, Mengqiu]Qingyuan Innovation Laboratory, Quanzhou, China
  • [ 3 ] [Song, Qianyu]College of Chemical Engineering, Fuzhou University, Fuzhou, China
  • [ 4 ] [Song, Qianyu]Qingyuan Innovation Laboratory, Quanzhou, China
  • [ 5 ] [Zheng, Lishuai]College of Chemical Engineering, Fuzhou University, Fuzhou, China
  • [ 6 ] [Zheng, Lishuai]Qingyuan Innovation Laboratory, Quanzhou, China
  • [ 7 ] [Hou, Linxi]College of Chemical Engineering, Fuzhou University, Fuzhou, China
  • [ 8 ] [Hou, Linxi]Qingyuan Innovation Laboratory, Quanzhou, China
  • [ 9 ] [Hou, Linxi]Fujian Key Laboratory of Advanced Manufacturing Technology of Specialty Chemicals, Fuzhou University, Fuzhou, China

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Source :

High Performance Polymers

ISSN: 0954-0083

Year: 2023

Issue: 10

Volume: 35

Page: 991-1000

1 . 8

JCR@2023

1 . 8 0 0

JCR@2023

JCR Journal Grade:3

CAS Journal Grade:4

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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