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author:

Wang, Linghua (Wang, Linghua.) [1] (Scholars:王凌华) | Peng, Hejie (Peng, Hejie.) [2] | Zheng, Langteng (Zheng, Langteng.) [3] | Chen, Huaixi (Chen, Huaixi.) [4] | Zhang, Yazhen (Zhang, Yazhen.) [5] | Huang, Jiwei (Huang, Jiwei.) [6] (Scholars:黄继伟) | Zhang, Xinbin (Zhang, Xinbin.) [7] | Feng, Xinkai (Feng, Xinkai.) [8] | Wei, Rongshan (Wei, Rongshan.) [9] (Scholars:魏榕山) | Wang, Shaohao (Wang, Shaohao.) [10] (Scholars:王少昊) | Zhu, Minmin (Zhu, Minmin.) [11] (Scholars:朱敏敏)

Indexed by:

EI Scopus SCIE

Abstract:

A broadband and CMOS-compatible polarization beam splitter and rotator (PSR) built on the silicon nitride -on-silicon multilayer platform is presented. The PSR is realized by cascading a polarization beam splitter and a polarization rotator, which are both subtly constructed with an asymmetrical directional coupler waveguide struc-ture. The advantage of this device is that the function of PSR can be directly realized in the SiN layer, providing a promising solution to the polarization diversity schemes in SiN photonic circuits. The chip is expected to have high power handling capability as the light is input from the SiN waveguide. The use of silicon dioxide as the upper cladding of the device ensures its compatibility with the metal back-end-of-line process. By optimizing the struc-ture parameters, a polarization conversion loss lower than 1 dB and cross talk larger than 27.6 dB can be obtained for TM-TE mode conversion over a wavelength range of 1450 to 1600 nm. For TE mode, the insertion loss is lower than 0.26 dB and cross talk is larger than 25.3 dB over the same wavelength range. The proposed device has good potential in diversifying the functionalities of the multilayer photonic chip with high integration density.(c) 2023 Optica Publishing Group

Keyword:

Community:

  • [ 1 ] [Wang, Linghua]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350116, Peoples R China
  • [ 2 ] [Peng, Hejie]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350116, Peoples R China
  • [ 3 ] [Zheng, Langteng]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350116, Peoples R China
  • [ 4 ] [Zhang, Yazhen]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350116, Peoples R China
  • [ 5 ] [Huang, Jiwei]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350116, Peoples R China
  • [ 6 ] [Wei, Rongshan]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350116, Peoples R China
  • [ 7 ] [Wang, Shaohao]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350116, Peoples R China
  • [ 8 ] [Zhu, Minmin]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350116, Peoples R China
  • [ 9 ] [Chen, Huaixi]Chinese Acad Sci, Fujian Inst Res Struct Matter, Key Lab Optoelect Mat Chem & Phys, Fuzhou 350002, Fujian, Peoples R China
  • [ 10 ] [Zhang, Xinbin]Chinese Acad Sci, Fujian Inst Res Struct Matter, Key Lab Optoelect Mat Chem & Phys, Fuzhou 350002, Fujian, Peoples R China
  • [ 11 ] [Feng, Xinkai]Chinese Acad Sci, Fujian Inst Res Struct Matter, Key Lab Optoelect Mat Chem & Phys, Fuzhou 350002, Fujian, Peoples R China
  • [ 12 ] [Chen, Huaixi]Univ Chinese Acad Sci, Beijing 100049, Peoples R China

Reprint 's Address:

  • 王凌华

    [Wang, Linghua]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350116, Peoples R China

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Source :

APPLIED OPTICS

ISSN: 1559-128X

Year: 2023

Issue: 4

Volume: 62

Page: 1046-1056

1 . 7

JCR@2023

1 . 7 0 0

JCR@2023

ESI Discipline: PHYSICS;

ESI HC Threshold:30

JCR Journal Grade:3

CAS Journal Grade:4

Cited Count:

WoS CC Cited Count: 6

SCOPUS Cited Count: 6

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 2

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