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author:

Wu, Wenyi (Wu, Wenyi.) [1] | Yu, Jinling (Yu, Jinling.) [2] (Scholars:俞金玲) | Xia, Lijia (Xia, Lijia.) [3] | Zhu, Kejing (Zhu, Kejing.) [4] | Zeng, Xiaolin (Zeng, Xiaolin.) [5] | Chen, Yonghai (Chen, Yonghai.) [6] | Yin, Chunming (Yin, Chunming.) [7] | Cheng, Shuying (Cheng, Shuying.) [8] (Scholars:程树英) | Lai, Yunfeng (Lai, Yunfeng.) [9] (Scholars:赖云锋) | He, Ke (He, Ke.) [10]

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EI SCIE

Abstract:

The photoinduced inverse spin Hall effect (PISHE) has been studied in three dimensional (3D) topological insulator (TI) Bi2Te3 thin films with different thicknesses (3, 5, 12 and 20 quintuple layer (QL)). The sign of the PISHE current flips only once in the 3- and 20-QL Bi2Te3 films, but it flips three times in the 5-, 7- and 12-QL samples. The three-times sign flip is due to the superposition of the PISHE current of the top and bottom surface states in Bi2Te3 films. By analyzing the x-ray photoelectron spectroscopy (XPS) of the Bi2Te3 films, we find that the top surface of the 3- and 20-QL Bi2Te3 films are severely oxidized, leading to only one sign flip in the PISHE. The PISHE contributed by the top and bottom surface states in Bi2Te3 films have been successfully separated by fitting a theoretical model to the PISHE current. The impact of the bulk states on PISHE current has been determined. The PISHE current is also measured at different light powers, and all the measurement results are in good agreement with the theoretical model. In addition, it is found that the PISHE current in Bi2Te3 films grown on Si substrate is more than two orders larger than that grown on SrTiO3 substrates, which can be attributed to the larger absorption coefficient for Bi2Te3/Si samples. It is revealed that the PISHE current in 3D TI Bi2Te3 is as large as 140 nA/W in the 3-QL Bi2Te3 film grown on Si substrate, which is more than one order larger than that reported in GaAs/AlGaAs heterojunction (about 2 nA/W) and GaN/AIGaN heterojunction (about 1.7 nA/W). The giant PISHE current demonstrates that the Tls with strong SOC may have good application prospects in spintronic devices with high spin-to-charge conversion efficiency. (C) 2022 Optica Publishing Group under the terms of the Optica Open Access Publishing Agreement

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  • [ 1 ] [Wu, Wenyi]Fuzhou Univ, Sch Phys & Informat Engn, Inst Micro Nano Devices & Solar Cells, Fuzhou 350108, Peoples R China
  • [ 2 ] [Yu, Jinling]Fuzhou Univ, Sch Phys & Informat Engn, Inst Micro Nano Devices & Solar Cells, Fuzhou 350108, Peoples R China
  • [ 3 ] [Xia, Lijia]Fuzhou Univ, Sch Phys & Informat Engn, Inst Micro Nano Devices & Solar Cells, Fuzhou 350108, Peoples R China
  • [ 4 ] [Cheng, Shuying]Fuzhou Univ, Sch Phys & Informat Engn, Inst Micro Nano Devices & Solar Cells, Fuzhou 350108, Peoples R China
  • [ 5 ] [Lai, Yunfeng]Fuzhou Univ, Sch Phys & Informat Engn, Inst Micro Nano Devices & Solar Cells, Fuzhou 350108, Peoples R China
  • [ 6 ] [Zhu, Kejing]Minghua Univ, Dept Phys, State Key Lab Low Dimens Quantum Phys, Beijing 100084, Peoples R China
  • [ 7 ] [He, Ke]Minghua Univ, Dept Phys, State Key Lab Low Dimens Quantum Phys, Beijing 100084, Peoples R China
  • [ 8 ] [Zeng, Xiaolin]Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
  • [ 9 ] [Chen, Yonghai]Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
  • [ 10 ] [Zeng, Xiaolin]Univ Chinese Acad Sci, Coll Mat Sci & Optoelect Technol, Beijing 100049, Peoples R China
  • [ 11 ] [Chen, Yonghai]Univ Chinese Acad Sci, Coll Mat Sci & Optoelect Technol, Beijing 100049, Peoples R China
  • [ 12 ] [Yin, Chunming]Univ New South Wales, Sch Phys, Sydney, NSW 2052, Australia
  • [ 13 ] [Yin, Chunming]Univ Sci & Technol China, Synerget Innovat Ctr Quantum Informat & Quantum P, Dept Modern Phys, CAS Key Lab Microscale Magnet Resonance, Hefei 230026, Peoples R China
  • [ 14 ] [Cheng, Shuying]Changzhou Univ, Jiangsu Collaborat Innovat Ctr Photovolat Sci & E, Changzhou 213164, Jiangsu, Peoples R China

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Source :

OPTICS EXPRESS

ISSN: 1094-4087

Year: 2022

Issue: 9

Volume: 30

Page: 15085-15095

3 . 8

JCR@2022

3 . 2 0 0

JCR@2023

ESI Discipline: PHYSICS;

ESI HC Threshold:55

JCR Journal Grade:2

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count: 1

SCOPUS Cited Count: 1

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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