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author:

Sun, L. (Sun, L..) [1] | Ye, Z. F. (Ye, Z. F..) [2] | Ma, L. A. (Ma, L. A..) [3] | Zhang, Y. A. (Zhang, Y. A..) [4] (Scholars:张永爱)

Indexed by:

EI Scopus SCIE

Abstract:

The field emission (FE) electron source has a wide range of application in the field of vacuum electronics, and the patterning of cathode emitters is one of the key technology. In this paper, a new idea of cathode structure to achieve good luminescence uniformity with the smallest emitter areas is proposed. First, the inkjet printing is applied to precisely position the patterned layer, and the branched ZnO arrays are grown by electrochemical deposition. Then the effect of array spacings on field emission performance is studied. The results show that with the increase of the array spacing, the FE performance first increases and then decreases, among which the arrays with the moderate spacing have the best FE properties, including the lowest turn-on field (Eon) of ~0.46 V mu m(-1) and the most uniform luminescence. Finite element calculations using the ANSYS software were performed. Simulations are carried out to analyze the surface electric field distribution and electron movement trajectory, indicating the moderate array spacing is beneficial for FE due to the balance of the field superposition effect and shielding effect. The efficiency of pattern design helps to realize the high-performance field emission electron source, which is of great significance for flexible manufacturing and large-scale integration.

Keyword:

Electrochemical deposition Field emission Patterned arrays Simulations

Community:

  • [ 1 ] [Sun, L.]Fuzhou Univ, Zhicheng Coll, Fuzhou 350002, Peoples R China
  • [ 2 ] [Ye, Z. F.]Fuzhou Univ, Zhicheng Coll, Fuzhou 350002, Peoples R China
  • [ 3 ] [Sun, L.]Fujian Sci & Technol Innovat Lab Optoelect Informa, Fuzhou 350108, Peoples R China
  • [ 4 ] [Zhang, Y. A.]Fujian Sci & Technol Innovat Lab Optoelect Informa, Fuzhou 350108, Peoples R China
  • [ 5 ] [Ma, L. A.]Fujian Univ Technol, Sch Mat Sci & Engn, Fuzhou 350118, Peoples R China
  • [ 6 ] [Zhang, Y. A.]Fuzhou Univ, Inst Optoelect Display, Natl & Local United Engn Lab Flat Panel Display Te, Fuzhou 350002, Peoples R China
  • [ 7 ] [Ye, Z. F.]Fuzhou Univ, Sch Phys & Informat Engn, Fuzhou 350002, Peoples R China

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Source :

VACUUM

ISSN: 0042-207X

Year: 2022

Volume: 201

4 . 0

JCR@2022

3 . 8 0 0

JCR@2023

ESI Discipline: MATERIALS SCIENCE;

ESI HC Threshold:91

JCR Journal Grade:2

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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