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author:

Zhang, Shuai (Zhang, Shuai.) [1] | Cheng, Shuying (Cheng, Shuying.) [2] (Scholars:程树英) | Jia, Hongjie (Jia, Hongjie.) [3] | Zhou, Haifang (Zhou, Haifang.) [4] (Scholars:周海芳)

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CPCI-S EI Scopus

Abstract:

Metallic-doping chalcogenide compounds have attracted significant interest in application of photovoltaic devices recently. In this article, Al-doped SnS films with a thickness of about 500 nm have been deposited on glass substrates by thermal evaporation technique. Al-doping concentration (from 0 at. % to 15 at.%) in the SnS films can be controlled accurately by varying Al layer thickness. The effects of Al-doping on the physical properties of the films have been investigated by X-ray diffraction, scanning electron microscopy, ultraviolet-visible-near infrared spectroscopy measurements and Hall effect measurement system. All the films are orthorhombic SnS with preferred (1 1 1) crystallites orientation, and they are of p-type conductivity. With the increasing of Al-doping concentration, the evaluated direct band gap E-dir of the SnS: Al films decreases from 1.50eV to 1.29eV and the conductivities of the films increase. Therefore, the optical and semiconducting properties of the SnS films have been improved by Al-doping.

Keyword:

optical and electrical properties SnS:Al thin films structure thermal evaporation

Community:

  • [ 1 ] [Zhang, Shuai]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350108, Peoples R China
  • [ 2 ] [Cheng, Shuying]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350108, Peoples R China
  • [ 3 ] [Jia, Hongjie]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350108, Peoples R China
  • [ 4 ] [Zhou, Haifang]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350108, Peoples R China

Reprint 's Address:

  • 张帅

    [Zhang, Shuai]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350108, Peoples R China

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Source :

MATERIALS PROCESSING TECHNOLOGY, PTS 1-3

ISSN: 1022-6680

Year: 2012

Volume: 418-420

Page: 712-716

Language: English

Cited Count:

WoS CC Cited Count: 20

SCOPUS Cited Count: 18

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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