Ag　thin　films　were　prepared　on　the　float-glass　substrate　by　DC　magnetron　sputtering　method.　The　relationship　of　surface　morphology/electrical　properties　with　technical　conditions　was　investigated.　The　experimental　results　showed　that　sputtering　power,　sputtering　pressure　and　substrate　temperature　had　effects　on　the　morphology　and　electrical　properties　of　Ag　thin　films.　The　optimum　parameters　were　obtained　with　sputtering　power　of　100　W,　sputtering　pressure　of　0.4　Pa　and　substrate　temperature　of　130　degrees　C.　Under　the　optimum　parameters,　the　deposited　Ag　thin　film　was　smooth　and　its　resistivity　was　as　low　as　1.96x10(8)　Omega.m.