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author:

Cheng, Shuying (Cheng, Shuying.) [1] (Scholars:程树英) | Chen, Yanqing (Chen, Yanqing.) [2] | He, Yingjie (He, Yingjie.) [3] | Chen, Guonan (Chen, Guonan.) [4] (Scholars:陈国南)

Indexed by:

EI Scopus SCIE

Abstract:

SnS films were prepared onto the ITO-coated glass substrates by pulse-form electro-deposition. The potential applied to the substrates was of pulse-form and its "on" potential, V-on was -0.75 V (vs. SCE)and "off" potential, V-off was varied in the range of -0.1-0.5 V. The SnS films deposited at different V-off values were characterized by XRD, EDX, SEM and optical measurements. It shows that all the films are polycrystalline orthorhombic SnS with grain sizes of 21.54-26.93 nm and lattice dimensions of a=0.4426-0.4431 nm, b= 1.1124-1.1134 nm and c=0.3970-0.3973 nm, though the V-off has some influence on the surface morphology of the films and Sn/S ratio. When V-off = 0.1-0.3 V, the SnS films have the best uniformity, density and adhesion, and the Sn/S ratio is close to 1/1. The direct band gap of the films was estimated to be between 1.23 and 1.33 eV with standard deviation within +/- 0.03 eV, which is close to the theoretical value. The SnS films exhibit p-type or n-type conductivity and their resistivity was measured to be 16.8-43.1 Omega cm. (c) 2006 Elsevier B.V. All rights reserved.

Keyword:

properties pulse electro-deposition SnS thin films structure

Community:

  • [ 1 ] Fuzhou Univ, MOE Key Lab Analyt & Detect Tech Food Safety, Fuzhou 350002, Peoples R China
  • [ 2 ] Fuzhou Univ, Dept Chem, Fuzhou 350002, Peoples R China
  • [ 3 ] Fuzhou Univ, Dept Elect Sci & Appl Phys, Fuzhou 350002, Peoples R China

Reprint 's Address:

  • 陈国南

    [Chen, Guonan]Fuzhou Univ, MOE Key Lab Analyt & Detect Tech Food Safety, Fuzhou 350002, Peoples R China

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Source :

MATERIALS LETTERS

ISSN: 0167-577X

Year: 2007

Issue: 6

Volume: 61

Page: 1408-1412

1 . 6 2 5

JCR@2007

2 . 7 0 0

JCR@2023

ESI Discipline: MATERIALS SCIENCE;

JCR Journal Grade:2

Cited Count:

WoS CC Cited Count: 60

SCOPUS Cited Count: 71

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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