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author:

Zhang, Y. A. (Zhang, Y. A..) [1] (Scholars:张永爱) | Wu, C. X. (Wu, C. X..) [2] | Lin, J. Y. (Lin, J. Y..) [3] | Lin, Z. X. (Lin, Z. X..) [4] (Scholars:林志贤) | Guo, T. L. (Guo, T. L..) [5] (Scholars:郭太良)

Indexed by:

EI Scopus SCIE

Abstract:

An improved planar-gate triode with carbon nanotubes (CNTs) field emitters has been successfully fabricated by conventional photolithography, screen printing and electrophoretic deposition (EPD). In this structure, cathode electrodes and ITO arrays linked with gate electrodes were interdigitated and paralleled on the same plane although the gate electrodes and cathode electrodes were isolated by dielectric layer, a so-called improved planar-gate triode structure. An electrophoretic process was developed to selectively deposit CNTs field emitters onto cathode electrodes in the CNTs suspension by an applied voltage between the gate electrodes and cathode electrodes. The optical microscopy and FESEM image showed that the CNTs emitters with the uniform packing density were selectively defined onto the cathode electrodes. In addition, field emission characteristics of an improved planar-gate triode with CNTs field emitters were investigated. The experiment results indicated that the turn-on voltage of this triode structure at current density of 1 mu A/cm(2) was approximately 55 V. The anode current and gate current came to 396 mu A and 325 mu A, at gate voltage and anode voltage of 100V and 4000 V, respectively and at the anode-cathode spacing of 2000 mu m. The emission image became brighter and the luminous image with dot matrix on the anode plate obviously increased with the increase of the gate voltage. Moreover, the emission current fluctuation was smaller than 5% for 11 h, which indicated that the improved planar-gate triode has a good field emission performance and long lifetime. (C) 2010 Elsevier B.V. All rights reserved.

Keyword:

Carbon nanotubes Electrophoretic deposition Field emission Planar-gate triode

Community:

  • [ 1 ] [Zhang, Y. A.]Fuzhou Univ, Sch Phys & Informat Engn, Inst Optoelect Display Technol, Fuzhou 350002, Peoples R China
  • [ 2 ] [Wu, C. X.]Fuzhou Univ, Sch Phys & Informat Engn, Inst Optoelect Display Technol, Fuzhou 350002, Peoples R China
  • [ 3 ] [Lin, J. Y.]Fuzhou Univ, Sch Phys & Informat Engn, Inst Optoelect Display Technol, Fuzhou 350002, Peoples R China
  • [ 4 ] [Lin, Z. X.]Fuzhou Univ, Sch Phys & Informat Engn, Inst Optoelect Display Technol, Fuzhou 350002, Peoples R China
  • [ 5 ] [Guo, T. L.]Fuzhou Univ, Sch Phys & Informat Engn, Inst Optoelect Display Technol, Fuzhou 350002, Peoples R China

Reprint 's Address:

  • 林志贤

    [Lin, Z. X.]Fuzhou Univ, Sch Phys & Informat Engn, Inst Optoelect Display Technol, Fuzhou 350002, Peoples R China

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Source :

APPLIED SURFACE SCIENCE

ISSN: 0169-4332

Year: 2011

Issue: 8

Volume: 257

Page: 3259-3264

2 . 1 0 3

JCR@2011

6 . 3 0 0

JCR@2023

ESI Discipline: MATERIALS SCIENCE;

JCR Journal Grade:1

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count: 10

SCOPUS Cited Count: 12

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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