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author:

Liu, Jiahui (Liu, Jiahui.) [1] | Ye, Yuliang (Ye, Yuliang.) [2] | Yang, Zunxian (Yang, Zunxian.) [3]

Indexed by:

EI SCIE

Abstract:

Artificial photoelectric synapses exhibit great potential for overcoming the Von Neumann bottleneck in computational systems. All-inorganic halide perovskites hold considerable promise in photoelectric synapses due to their superior photon-harvesting efficiency. In this study, a novel wavy-structured CsPbBr3/ZnO hybrid film was realized by depositing zinc oxide (ZnO) onto island-like CsPbBr3 film via atomic layer deposition (ALD) at 70 degrees C. Due to the capability of ALD to grow high-quality films over small surface areas, dense and thin ZnO film filled the gaps between the island-shaped CsPbBr3 grains, thereby enabling reduced light-absorption losses and efficient charge transport between the CsPbBr3 light absorber and the ZnO electron-transport layer. This ZnO/island-like CsPbBr3 hybrid synaptic transistor could operate at a drain-source voltage of 1.0 V and a gate-source voltage of 0 V triggered by green light (500 nm) pulses with low light intensities of 0.035 mW/cm(2). The device exhibited a quiescent current of similar to 0.5 nA. Notably, after patterning, it achieved a significantly reduced off-state current of 10(-11) A and decreased the quiescent current to 0.02 nA. In addition, this transistor was able to mimic fundamental synaptic behaviors, including excitatory postsynaptic currents (EPSCs), paired-pulse facilitation (PPF), short-term to long-term plasticity (STP to LTP) transitions, and learning-experience behaviors. This straightforward strategy demonstrates the possibility of utilizing neuromorphic synaptic device applications under low voltage and weak light conditions.

Keyword:

atomic layer deposition island-like perovskite film metal oxide quiescent current synaptic hybrid phototransistors

Community:

  • [ 1 ] [Liu, Jiahui]Huaqiao Univ, Coll Informat Sci & Engn, Xiamen 361021, Peoples R China
  • [ 2 ] [Ye, Yuliang]Fuzhou Univ, Natl & Local United Engn Lab Flat Panel Display Te, Fuzhou 350108, Peoples R China
  • [ 3 ] [Yang, Zunxian]Fuzhou Univ, Natl & Local United Engn Lab Flat Panel Display Te, Fuzhou 350108, Peoples R China

Reprint 's Address:

  • [Liu, Jiahui]Huaqiao Univ, Coll Informat Sci & Engn, Xiamen 361021, Peoples R China;;[Yang, Zunxian]Fuzhou Univ, Natl & Local United Engn Lab Flat Panel Display Te, Fuzhou 350108, Peoples R China

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Source :

MATERIALS

Year: 2025

Issue: 12

Volume: 18

3 . 1 0 0

JCR@2023

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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