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author:

Ni, Zifeng (Ni, Zifeng.) [1] | Chen, Zongyu (Chen, Zongyu.) [2] | Chen, Guomei (Chen, Guomei.) [3] | Lu, Xueyu (Lu, Xueyu.) [4] | Chen, Guohua (Chen, Guohua.) [5] | Liu, Ming (Liu, Ming.) [6]

Indexed by:

EI Scopus SCIE

Abstract:

The effect of anisotropy, which is crucial for manufacturing single crystals, was investigated in this study by performing nanoindentation experiments on the Si/C plane of single crystal 4H-SiC with the edge of Berkovich indenter toward with two different crystal orientations of [1120]\documentclass[12pt]{minimal} \usepackage{amsmath} \usepackage{wasysym} \usepackage{amsfonts} \usepackage{amssymb} \usepackage{amsbsy} \usepackage{mathrsfs} \usepackage{upgreek} \setlength{\oddsidemargin}{-69pt} \begin{document}$$[11\overline{2} 0]$$\end{document}/[1100]\documentclass[12pt]{minimal} \usepackage{amsmath} \usepackage{wasysym} \usepackage{amsfonts} \usepackage{amssymb} \usepackage{amsbsy} \usepackage{mathrsfs} \usepackage{upgreek} \setlength{\oddsidemargin}{-69pt} \begin{document}$$[1\overline{1} 00]$$\end{document}. On the Si plane, when the edge was toward crystal orientation [1120]\documentclass[12pt]{minimal} \usepackage{amsmath} \usepackage{wasysym} \usepackage{amsfonts} \usepackage{amssymb} \usepackage{amsbsy} \usepackage{mathrsfs} \usepackage{upgreek} \setlength{\oddsidemargin}{-69pt} \begin{document}$$[11\overline{2} 0]$$\end{document}/[1100]\documentclass[12pt]{minimal} \usepackage{amsmath} \usepackage{wasysym} \usepackage{amsfonts} \usepackage{amssymb} \usepackage{amsbsy} \usepackage{mathrsfs} \usepackage{upgreek} \setlength{\oddsidemargin}{-69pt} \begin{document}$$[1\overline{1} 00]$$\end{document}, the indentation hardness is 39.37/39.77 GPa, the elastic modulus is 528.16/513.88 GPa, and the fracture toughness is 3.286/2.609 MPam1/2. On the C plane, when the edge was toward crystal orientation [1120]\documentclass[12pt]{minimal} \usepackage{amsmath} \usepackage{wasysym} \usepackage{amsfonts} \usepackage{amssymb} \usepackage{amsbsy} \usepackage{mathrsfs} \usepackage{upgreek} \setlength{\oddsidemargin}{-69pt} \begin{document}$$[11\overline{2} 0]$$\end{document}/[1100]\documentclass[12pt]{minimal} \usepackage{amsmath} \usepackage{wasysym} \usepackage{amsfonts} \usepackage{amssymb} \usepackage{amsbsy} \usepackage{mathrsfs} \usepackage{upgreek} \setlength{\oddsidemargin}{-69pt} \begin{document}$$[1\overline{1} 00]$$\end{document}, the indentation hardness is 43.66/41.91 GPa, the elastic modulus is 522.24/546.54 GPa and the fracture toughness is 2.826/2.705 MPam1/2. At the same time, the Vickers hardness crack induction method was used to calculate the fracture toughness, regardless of the Si or C plane, the fracture toughness value of the crystal orientation [1120]\documentclass[12pt]{minimal} \usepackage{amsmath} \usepackage{wasysym} \usepackage{amsfonts} \usepackage{amssymb} \usepackage{amsbsy} \usepackage{mathrsfs} \usepackage{upgreek} \setlength{\oddsidemargin}{-69pt} \begin{document}$$[11\overline{2} 0]$$\end{document} is generally greater than that [1100]\documentclass[12pt]{minimal} \usepackage{amsmath} \usepackage{wasysym} \usepackage{amsfonts} \usepackage{amssymb} \usepackage{amsbsy} \usepackage{mathrsfs} \usepackage{upgreek} \setlength{\oddsidemargin}{-69pt} \begin{document}$$[1\overline{1} 00]$$\end{document}. Molecular dynamics (MD) indentation simulations were carried out with the indenter edge facing different crystal directions of the Si plane. There is obvious anisotropy in the depth of the amorphous atomic layer, the number and proportion of dislocation nucleation, and the shear strain expansion. Although microscratch experiments combined with the analysis of scratch variables and the optical topography of scratches, it is concluded that the scratch deformation damage towards the crystal orientation [1100]\documentclass[12pt]{minimal} \usepackage{amsmath} \usepackage{wasysym} \usepackage{amsfonts} \usepackage{amssymb} \usepackage{amsbsy} \usepackage{mathrsfs} \usepackage{upgreek} \setlength{\oddsidemargin}{-69pt} \begin{document}$$[1\overline{1} 00]$$\end{document} is smaller. This study can provide theoretical guidance for the ultra-precision machining of the anisotropy of 4H-SiC crystal structure.

Keyword:

Anisotropy of single crystal 4H-SiC Microscratch Molecular dynamics simulation Nanoindentation

Community:

  • [ 1 ] [Ni, Zifeng]Jiangnan Univ, Sch Mech Engn, Wuxi 214122, Peoples R China
  • [ 2 ] [Chen, Zongyu]Jiangnan Univ, Sch Mech Engn, Wuxi 214122, Peoples R China
  • [ 3 ] [Lu, Xueyu]Jiangnan Univ, Sch Mech Engn, Wuxi 214122, Peoples R China
  • [ 4 ] [Chen, Guomei]Wuxi Vocat Inst Commerce, Sch Mech & Elect Engn, Wuxi 214153, Jiangsu, Peoples R China
  • [ 5 ] [Chen, Guohua]Wuxi Grind Semicond Technol Co Ltd, Wuxi 214153, Jiangsu, Peoples R China
  • [ 6 ] [Liu, Ming]Fuzhou Univ, Sch Mech Engn & Automat, Fujian Prov Key Lab Terahertz Funct Devices & Inte, Fuzhou 350108, Fujian, Peoples R China

Reprint 's Address:

  • [Ni, Zifeng]Jiangnan Univ, Sch Mech Engn, Wuxi 214122, Peoples R China

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Source :

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING

ISSN: 0947-8396

Year: 2025

Issue: 3

Volume: 131

2 . 5 0 0

JCR@2023

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 2

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