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[期刊论文]

Intramolecular Hydrogen Bonding Interactions Induced Enhancement in Resistive Switching Memory Performance for Covalent Organic Framework-Based Memristors

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author:

Yu, Hongling (Yu, Hongling.) [1] | Zhou, Pan-Ke (Zhou, Pan-Ke.) [2] | Chen, Xiong (Chen, Xiong.) [3] (Scholars:陈雄)

Indexed by:

EI Scopus SCIE

Abstract:

Covalent organic frameworks (COFs) are promising active mediums for high-performance data storage devices stemming from their high crystallinity, ordered porous channels, predetermined topology, and rigid architectures, while relative studies are still limited. Here, two COFs (i.e., COF-EtD and COF-EtA)-based resistive-switching memory devices are proposed to demonstrate the impact of intramolecular hydrogen bonding interactions, both of which exhibit nonvolatile write-once-read-many (WORM) memory characteristics. Comparatively, COF-EtD with the hydroxyl motif decoration illustrated a lower SET voltage (i.e., turn-on voltage) and a higher ON/OFF current ratio as well as exceptional high-temperature endurance and solvent resistance. Mechanism explorations suggest that the resistance-switching behavior of COF-EtD may be controlled by the synergistic effect of space-charge-limited current and conductive filaments. This finding is the first example of simply varying the functional group of COFs to regulate the WORM resistive switching behavior, providing some inspiration for the advancement of electronic memories and positively contributing to the realization of high endurance and high-density electric storage materials.

Keyword:

covalent organic frameworks harsh environments hydrogen bonds nonvolatile resistive memory devices

Community:

  • [ 1 ] [Yu, Hongling]Fuzhou Univ, Coll Chem, State Key Lab Photocatalysis Energy & Environm, Fuzhou 350108, Peoples R China
  • [ 2 ] [Zhou, Pan-Ke]Fuzhou Univ, Coll Chem, State Key Lab Photocatalysis Energy & Environm, Fuzhou 350108, Peoples R China
  • [ 3 ] [Chen, Xiong]Fuzhou Univ, Coll Chem, State Key Lab Photocatalysis Energy & Environm, Fuzhou 350108, Peoples R China

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Source :

ADVANCED FUNCTIONAL MATERIALS

ISSN: 1616-301X

Year: 2023

Issue: 44

Volume: 33

1 8 . 5

JCR@2023

1 8 . 5 0 0

JCR@2023

JCR Journal Grade:1

CAS Journal Grade:1

Cited Count:

WoS CC Cited Count: 22

SCOPUS Cited Count: 23

30 Days PV: 1

查看更多>>操作日志

管理员  2025-03-18 06:28:16  更新被引

管理员  2025-03-18 06:28:11  更新被引

管理员  2024-12-27 00:30:12  更新被引

管理员  2024-11-01 00:55:40  更新被引

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