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author:

Wu, Shengyuan (Wu, Shengyuan.) [1] | Zhang, Xianghong (Zhang, Xianghong.) [2] | Peng, Gang (Peng, Gang.) [3] | Chen, Huipeng (Chen, Huipeng.) [4] (Scholars:陈惠鹏) | Guo, Tailiang (Guo, Tailiang.) [5] (Scholars:郭太良)

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EI

Abstract:

Synaptic devices are progressing towards large-scale integration, but artificial neuron device research is still in its infancy. NbOx is an artificial neuron core material, but the Vth, Vhold of the threshold shift of NbOx will shift within a certain range, which will be unfavorable for making oscillating neurons.In this paper, We explore the Vth and Vhold shift and electrical properties of NbOx volatile memristor in different temperatures. The results indicate that the window of I-V behaves more stable at low temperatures, and higher temperatures would make the window stochastic increasing and more prone to failure. Furthermore, this suggests that the reduction of the high resistance state of the volatile NbOx memristor is due to the reduction of the Schottky barrier. © 2022 SPIE.

Keyword:

Coremaking Memristors Metal insulator boundaries Metal insulator transition Neurons Niobium oxide Schottky barrier diodes Semiconductor insulator boundaries Stochastic systems

Community:

  • [ 1 ] [Wu, Shengyuan]Institute of Optoelectronic Display, National & Local United Engineering Lab of Flat Panel Display Technology, Fuzhou University, Fuzhou; 350002, China
  • [ 2 ] [Zhang, Xianghong]Institute of Optoelectronic Display, National & Local United Engineering Lab of Flat Panel Display Technology, Fuzhou University, Fuzhou; 350002, China
  • [ 3 ] [Peng, Gang]Institute of Optoelectronic Display, National & Local United Engineering Lab of Flat Panel Display Technology, Fuzhou University, Fuzhou; 350002, China
  • [ 4 ] [Chen, Huipeng]Institute of Optoelectronic Display, National & Local United Engineering Lab of Flat Panel Display Technology, Fuzhou University, Fuzhou; 350002, China
  • [ 5 ] [Chen, Huipeng]Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou; 350100, China
  • [ 6 ] [Guo, Tailiang]Institute of Optoelectronic Display, National & Local United Engineering Lab of Flat Panel Display Technology, Fuzhou University, Fuzhou; 350002, China
  • [ 7 ] [Guo, Tailiang]Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou; 350100, China

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ISSN: 0277-786X

Year: 2022

Volume: 12258

Language: English

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ESI Highly Cited Papers on the List: 0 Unfold All

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Chinese Cited Count:

30 Days PV: 8

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