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author:

Zhang, Zhen (Zhang, Zhen.) [1] | Shu, Shengwen (Shu, Shengwen.) [2] (Scholars:舒胜文) | Wang, Zhiguo (Wang, Zhiguo.) [3] | Xie, Zhengqiu (Xie, Zhengqiu.) [4] | Wang, Huizhong (Wang, Huizhong.) [5] | Li, Chunchun (Li, Chunchun.) [6] | Ke, Shanming (Ke, Shanming.) [7] | Shu, Longlong (Shu, Longlong.) [8]

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EI Scopus SCIE

Abstract:

Significant flexoelectricity is expected to exist in materials with colossal permittivity. Here, we systematically studied the interplay of flexoelectricity and permittivity in CaCu3Ti4O12 (CCTO) ceramic by examining the thickness and electrode dependence of the flexoelectric coefficients over a wide range of temperatures. We found that an abnormal flexoelectric transition occurs at 95 ?. Below this critical temperature, the barrier layer mechanism dominates the significant flexoelectricity in CCTO ceramic, whereas above this critical temperature, the flexoelectric response mainly originates from the contributions of semiconducting grains and insulating grain boundaries. The observed flexoelectric transition is beneficial not only for developing new materials with high flexoelectric coefficients but also for understanding the colossal permittivity mechanism in CCTO ceramics.

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Community:

  • [ 1 ] [Zhang, Zhen]Nanchang Univ, Sch Mat Sci & Engn, Nanchang 330031, Peoples R China
  • [ 2 ] [Wang, Zhiguo]Nanchang Univ, Sch Mat Sci & Engn, Nanchang 330031, Peoples R China
  • [ 3 ] [Li, Chunchun]Nanchang Univ, Sch Mat Sci & Engn, Nanchang 330031, Peoples R China
  • [ 4 ] [Ke, Shanming]Nanchang Univ, Sch Mat Sci & Engn, Nanchang 330031, Peoples R China
  • [ 5 ] [Shu, Longlong]Nanchang Univ, Sch Mat Sci & Engn, Nanchang 330031, Peoples R China
  • [ 6 ] [Shu, Shengwen]Fuzhou Univ, Coll Elect Engn & Automat, Fuzhou 350108, Peoples R China
  • [ 7 ] [Xie, Zhengqiu]Chongqing Univ Technol, Coll Mech Engn, Chongqing 400050, Peoples R China
  • [ 8 ] [Wang, Huizhong]Univ New South Wales, Mat Sci & Engn, Sydney, NSW 2052, Australia

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Source :

JOURNAL OF APPLIED PHYSICS

ISSN: 0021-8979

Year: 2022

Issue: 2

Volume: 132

3 . 2

JCR@2022

2 . 7 0 0

JCR@2023

ESI Discipline: PHYSICS;

ESI HC Threshold:55

JCR Journal Grade:2

CAS Journal Grade:3

Cited Count:

WoS CC Cited Count: 6

SCOPUS Cited Count: 6

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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