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author:

Miao, Yu (Miao, Yu.) [1] | Liang, Bing (Liang, Bing.) [2] | Tian, Yaoyao (Tian, Yaoyao.) [3] | Xiong, Tinghui (Xiong, Tinghui.) [4] | Sun, Shujing (Sun, Shujing.) [5] | Chen, Chenlong (Chen, Chenlong.) [6]

Indexed by:

EI SCIE

Abstract:

Changing the direction of horizontal nanowires to extend them in the z direction and grow obliquely has important practical significance for achieving higher density integration and making it have more free space in multi-dimension. However, how to guide the horizontal nanowires to extend in the z direction and grow obliquely is still a challenge. In this paper, we report the regular and horizontal beta-Ga2O3 nanostructure grown on c-plane Al2O3 substrates, and the evolution of beta-Ga2O3 nanowires from horizontal growth to obliquely upward growth through the chemical vapor deposition (CVD) method. Field-emission scanning electron microscopy, field-emission transmission electron microscopy, X-ray diffraction, Raman spectrum and photoluminescence spectroscopy were used to investigate the morphology, structure, components, and optical properties of the assynthesized beta-Ga2O3 nanowires. Due to the change of the growth interface at the Au catalysts, there are four different growth modes for the growth of beta-Ga2O3 nanowires. The preparation route reported in this study is more simple, general and low-cost compared to other common growth methods for Ga2O3 nanomaterials, and these studies about the evolution of nanowires growth can provide a reference for the change of growth direction of nanowires and simplify planar device processing technology.

Keyword:

beta-Ga2O3 CVD Epitaxy Nanowire Sapphire VLS

Community:

  • [ 1 ] [Miao, Yu]Fuzhou Univ, Coll Chem, Fuzhou 350116, Fujian, Peoples R China
  • [ 2 ] [Liang, Bing]Fuzhou Univ, Coll Chem, Fuzhou 350116, Fujian, Peoples R China
  • [ 3 ] [Xiong, Tinghui]Fuzhou Univ, Coll Chem, Fuzhou 350116, Fujian, Peoples R China
  • [ 4 ] [Miao, Yu]Chinese Acad Sci, Fujian Inst Res Struct Matter, Key Lab Optoelect Mat Chem & Phys, Fuzhou 350002, Peoples R China
  • [ 5 ] [Liang, Bing]Chinese Acad Sci, Fujian Inst Res Struct Matter, Key Lab Optoelect Mat Chem & Phys, Fuzhou 350002, Peoples R China
  • [ 6 ] [Tian, Yaoyao]Chinese Acad Sci, Fujian Inst Res Struct Matter, Key Lab Optoelect Mat Chem & Phys, Fuzhou 350002, Peoples R China
  • [ 7 ] [Xiong, Tinghui]Chinese Acad Sci, Fujian Inst Res Struct Matter, Key Lab Optoelect Mat Chem & Phys, Fuzhou 350002, Peoples R China
  • [ 8 ] [Sun, Shujing]Chinese Acad Sci, Fujian Inst Res Struct Matter, Key Lab Optoelect Mat Chem & Phys, Fuzhou 350002, Peoples R China
  • [ 9 ] [Chen, Chenlong]Chinese Acad Sci, Fujian Inst Res Struct Matter, Key Lab Optoelect Mat Chem & Phys, Fuzhou 350002, Peoples R China

Reprint 's Address:

  • [Chen, Chenlong]Chinese Acad Sci, Fujian Inst Res Struct Matter, Key Lab Optoelect Mat Chem & Phys, Fuzhou 350002, Peoples R China

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Source :

VACUUM

ISSN: 0042-207X

Year: 2021

Volume: 192

4 . 1 1

JCR@2021

3 . 8 0 0

JCR@2023

ESI Discipline: MATERIALS SCIENCE;

ESI HC Threshold:142

JCR Journal Grade:2

CAS Journal Grade:3

Cited Count:

WoS CC Cited Count: 17

SCOPUS Cited Count: 18

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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