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author:

王显彬 (王显彬.) [1] | 谢华 (谢华.) [2]

Indexed by:

CQVIP CSCD

Abstract:

采用薄片弯曲法测量不同pH值和不同热处理对化学镀镍层内应力的影响,分析了产生变化的原因。结果表明,当镀液pH值为3.8-4.1和4.4-4.6时,镀层受到的内应力为压应力,而当镀液pH值为4.8-5.1时,镀层受到的内应力为拉应力。镀液pH值越高,镀层中磷含量越低,其内应力越高。经过200℃×1h热处理,镀层的内应力减小;经过400℃×1h或600℃×1h热处理,镀层的内应力增大。

Keyword:

内应力 化学镀镍 薄片弯曲法

Community:

  • [ 1 ] 福州大学机械工程学院,福建福州350002

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Source :

电镀与环保

ISSN: 1000-4742

Year: 2006

Issue: 3

Volume: 26

Page: 25-27

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count: -1

30 Days PV: 2

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