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author:

He, Y.-N. (He, Y.-N..) [1] | Zhu, J.-Q. (Zhu, J.-Q..) [2] | Zhang, T. (Zhang, T..) [3] | Wang, X. (Wang, X..) [4] | Tang, D. (Tang, D..) [5] (Scholars:唐电)

Indexed by:

Scopus CSCD

Abstract:

A series of nominal composition Ti/(ZrO2)x(RuO 2)1-x (0.1≤x≤0.9) coatings changed in 10% steps was deposited on titanium substrate from RuCl3·nH2O and ZrCl4 containing ethanol solution by thermal decomposition method. The X-ray diffraction (XRD), high-resolution transmission electron microscopy (HR-TEM) and electrochemical tests were performed to clarify the effects of ZrO2 content on the structure and capacitive property of Ti/(ZrO 2)x(RuO2)1-x. The results show that by adding ZrO2 into the coatings the degree of crystallization of RuO2 decreases. The specific capacitance firstly increases and then deceases with the increase of ZrO2 content in the mixed oxide coatings. The film of Ti/(ZrO2)0.6(RuO2) 0.4 consisting of amorphous matrix and fine nano-crystalline RuO 2 (about 4 nm) has the maximum specific capacitance of 713.27 F/g(RuO2).

Keyword:

Amorphous state; Crystal structure; RuO2; Super-capacitor; ZrO2

Community:

  • [ 1 ] [He, Y.-N.]Institute for Materials Research, Fuzhou University, Fuzhou 350108, China
  • [ 2 ] [Zhu, J.-Q.]Institute for Materials Research, Fuzhou University, Fuzhou 350108, China
  • [ 3 ] [Zhu, J.-Q.]Research Institute of Metallurgical Industries of Fujian, Fuzhou 350011, China
  • [ 4 ] [Zhang, T.]Institute for Materials Research, Fuzhou University, Fuzhou 350108, China
  • [ 5 ] [Wang, X.]Institute for Materials Research, Fuzhou University, Fuzhou 350108, China
  • [ 6 ] [Tang, D.]Institute for Materials Research, Fuzhou University, Fuzhou 350108, China

Reprint 's Address:

  • 朱君秋

    [Zhu, J.-Q.]Institute for Materials Research, Fuzhou University, Fuzhou 350108, China

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Source :

Jiegou Huaxue

ISSN: 0254-5861

CN: 35-1112/TQ

Year: 2013

Issue: 2

Volume: 32

Page: 231-235

0 . 4 7 7

JCR@2013

5 . 9 0 0

JCR@2023

ESI Discipline: CHEMISTRY;

JCR Journal Grade:4

CAS Journal Grade:4

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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