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author:

Cheng, Shuying (Cheng, Shuying.) [1] | He, Yingjie (He, Yingjie.) [2] | Chen, Guonan (Chen, Guonan.) [3] | Cho, Eun-Chel (Cho, Eun-Chel.) [4] | Conibeer, Gavin (Conibeer, Gavin.) [5]

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EI

Abstract:

Tin sulfide (SnS) thin films were deposited onto indium tin oxide (ITO) glass substrates by cathodic electro-deposition from aqueous solution containing ethylene diamine tetraacetate acid (EDTA). Because EDTA can slow the deposition rate of Sn through formation of Sn chelates, it is possible to obtain stoichiometric SnS films with good quality by adding EDTA to the deposition bath. The deposited films were characterized with X-ray diffraction (XRD), atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS), Raman spectroscopy (Raman), and ultraviolet-visible-near infrared (UV-VIS-NIR) spectrophotometer. The as-deposited films are mainly polycrystalline SnS with orthorhombic crystalline structure, and they show good uniformity and surface coverage with root mean square (RMS) roughness of 45.36-62.39nm and grain sizes of 100-300nm. Raman microscopy shows that the films have bands at around 190and 218cm- 1 belonging to Ag mode of SnS. The concentration ratio of EDTA and Sn2+ (EDTA/Sn2+) has some influence on the structure, phase, Raman shift and optical properties of the deposited films. When the EDTA/Sn2+ is less than 0.5, the films have a Raman shift at around 306cm- 1 due to Sn2S3. XPS analysis also shows that there exists a Sn2S3 phase in the deposited films. When the EDTA/Sn2+ equals 1/1, there is only the SnS phase in the deposited films. With an increase of the EDTA/Sn2+ from 0.1 to 1, the direct band gap of the films is decreased from 1.75eV to 1.43eV. Therefore EDTA/Sn2+ = 1/1 is good for depositing SnS films. © 2008 Elsevier B.V. All rights reserved.

Keyword:

Amines Atomic force microscopy Deposition rates Energy gap Ethylene Ethylenediaminetetraacetic acid Indium compounds Infrared devices ITO glass IV-VI semiconductors Layered semiconductors Optical properties Silver metallography Structure (composition) Substrates Sulfur compounds Thin films Tin oxides X ray photoelectron spectroscopy

Community:

  • [ 1 ] [Cheng, Shuying]State Key Laboratory Breeding Base of Photocatalysis, Department of Electronic Science and Applied Physics, Fuzhou University, Fuzhou, 350002, China
  • [ 2 ] [Cheng, Shuying]The MOE Key Lab of Analytical and Detection Technique For Food Safety, Chemistry Department, Fuzhou University, Fuzhou, Fujian 350002, China
  • [ 3 ] [Cheng, Shuying]ARC Photovoltaics Centre of Excellence, UNSW, Sydney, NSW 2052, Australia
  • [ 4 ] [He, Yingjie]The MOE Key Lab of Analytical and Detection Technique For Food Safety, Chemistry Department, Fuzhou University, Fuzhou, Fujian 350002, China
  • [ 5 ] [Chen, Guonan]The MOE Key Lab of Analytical and Detection Technique For Food Safety, Chemistry Department, Fuzhou University, Fuzhou, Fujian 350002, China
  • [ 6 ] [Cho, Eun-Chel]ARC Photovoltaics Centre of Excellence, UNSW, Sydney, NSW 2052, Australia
  • [ 7 ] [Conibeer, Gavin]ARC Photovoltaics Centre of Excellence, UNSW, Sydney, NSW 2052, Australia

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Source :

Surface and Coatings Technology

ISSN: 0257-8972

Year: 2008

Issue: 24

Volume: 202

Page: 6070-6074

1 . 8 6

JCR@2008

5 . 4 0 0

JCR@2023

JCR Journal Grade:1

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count: 45

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 6

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