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author:

Wang, Jingyuan (Wang, Jingyuan.) [1] | Wang, Xinghui (Wang, Xinghui.) [2] | Lee, Seok Woo (Lee, Seok Woo.) [3] | Zhang, Qing (Zhang, Qing.) [4]

Indexed by:

EI

Abstract:

In this work, the performance of a novel three-dimensional carbon-based planar microsupercapacitor (MSC) electrode structure is investigated. An in situ template-free fabrication of the Cu nanowire network structure acting as the current collector is first prepared through a chemical oxidation phase of sputtered Cu films, followed by a thermal reduction phase. Carbon is subsequently grown over the Cu nanostructure. In a two-electrode electrochemical test, the patterned interdigitated carbon/Cu nanowire network device exhibits an excellent maximum areal and volumetric capacitance of 1.45 and 7.43 mF cm-3, respectively, while retaining 94.2% of its capacitance after 10 000 charge-discharge cycles. This relatively simple foundry-compatible fabrication process provides an excellent method in which planar MSCs can be patterned and fabricated for energy storage solutions in microelectronics. Copyright © 2019 American Chemical Society.

Keyword:

Capacitance Carbon Chemical vapor deposition Electric discharges Electrochemical electrodes Energy storage Microelectronics Nanowires

Community:

  • [ 1 ] [Wang, Jingyuan]NOVITAS, Nanoelectronics Centre of Excellence, School of Electrical and Electronic Engineering, Nanyang Technological University, Singapore; 639798, Singapore
  • [ 2 ] [Wang, Jingyuan]Wintech Nano-Technology Services Private Limited, Singapore; 117684, Singapore
  • [ 3 ] [Wang, Xinghui]College of Physics and Information Engineering, Institute of Micro-Nano Devices and Solar Cells, Fuzhou University, Fuzhou; 350108, China
  • [ 4 ] [Lee, Seok Woo]NOVITAS, Nanoelectronics Centre of Excellence, School of Electrical and Electronic Engineering, Nanyang Technological University, Singapore; 639798, Singapore
  • [ 5 ] [Zhang, Qing]NOVITAS, Nanoelectronics Centre of Excellence, School of Electrical and Electronic Engineering, Nanyang Technological University, Singapore; 639798, Singapore

Reprint 's Address:

  • [zhang, qing]novitas, nanoelectronics centre of excellence, school of electrical and electronic engineering, nanyang technological university, singapore; 639798, singapore

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Source :

ACS Applied Materials and Interfaces

ISSN: 1944-8244

Year: 2019

Issue: 43

Volume: 11

Page: 40481-40489

8 . 7 5 8

JCR@2019

8 . 5 0 0

JCR@2023

ESI HC Threshold:236

JCR Journal Grade:1

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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