Thin　films　of　NiO　have　been　prepared　using　potentiostatic　electrodeposition　technique　from　an　aqueous　electrolytic　bath　containing　NiSO4.　Deposited　films　have　been　characterized　using　x-ray　diffraction,　scanning　electron　microscopy　and　energy　dispersive　analysis　by　x-rays.　X-ray　diffraction　patterns　showed　that　the　prepared　films　possess　polycrystalline　nature　with　face　centered　cubic　structure.　Surface　morphology　and　film　composition　showed　that　films　with　better　stoichiometry　and　smooth　surface　are　obtained　at　optimized　growth　condition.　Optical　absorption　analysis　showed　that　the　prepared　films　possess　direct　band　gap　value　around　3.46　eV.