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author:

Lei, Chen (Lei, Chen.) [1] | Pan, Zhang (Pan, Zhang.) [2] | Chen Jianxiong (Chen Jianxiong.) [3] (Scholars:陈剑雄) | Tu, Paul (Tu, Paul.) [4]

Indexed by:

EI Scopus SCIE

Abstract:

The processing of an ultra-short pulse laser is widely discussed and used in the field of micro machining, especially for precision processing of the hard and brittle materials. Firstly, the ablation ability would reduce with the defocusing distance increase in theory. However, it was found that the microchannel ablation depth is not sensitive to the defocusing distance in the experiments. The theoretical analysis and simulation calculation were carried out in this paper in order to explain the reason for the relationship between them. Secondly, the size of microchannel structure of the silicon wafer and quartz glass in our experiments were determined obviously by the main processing parameters of femtosecond laser. Furthermore, the influence of laser parameters on the structure size was studied. It was proven that the high quality processed of microchannel depend on the reasonable selection and combination of the parameters by femtosecond laser, which provided an important suggestion to process microchannel precisely. (C) 2018 Elsevier Ltd. All rights reserved.

Keyword:

Defocusing distance Femtosecond laser Laser ablation volume Microchannel milling Processing parameter

Community:

  • [ 1 ] [Lei, Chen]Shanghai Maritime Univ, Merchant Marine Coll, Shanghai, Peoples R China
  • [ 2 ] [Pan, Zhang]Shanghai Maritime Univ, Logist Engn Coll, Shanghai, Peoples R China
  • [ 3 ] [Chen Jianxiong]Fuzhou Univ, Sch Mech Engn & Automat, Fuzhou, Fujian, Peoples R China
  • [ 4 ] [Tu, Paul]Univ Calgary, Dept Mech & Mfg Engn, Calgary, AB, Canada

Reprint 's Address:

  • [Pan, Zhang]Shanghai Maritime Univ, Logist Engn Coll, Shanghai, Peoples R China

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Source :

OPTICS AND LASER TECHNOLOGY

ISSN: 0030-3992

Year: 2018

Volume: 106

Page: 47-51

3 . 3 1 9

JCR@2018

4 . 6 0 0

JCR@2023

ESI Discipline: ENGINEERING;

ESI HC Threshold:170

JCR Journal Grade:1

CAS Journal Grade:3

Cited Count:

WoS CC Cited Count: 25

SCOPUS Cited Count: 26

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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