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author:

Lee, Jeong Heon (Lee, Jeong Heon.) [1] | Wu, Chaoxing (Wu, Chaoxing.) [2] (Scholars:吴朝兴) | Sung, Sihyun (Sung, Sihyun.) [3] | An, Haoqun (An, Haoqun.) [4] | Kim, Tae Whan (Kim, Tae Whan.) [5]

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Scopus SCIE

Abstract:

This paper reports data for the electrical characteristics and the operating mechanisms of flexible resistive switching devices based on WS2 nanosheets (NSs) dispersed in a poly(methyl methacrylate) (PMMA) layer. The ON/OFF ratio of the memristive device based on an Al/WS2 NSs:PMMA/indium tin oxides (ITO) structure was approximately 5.9 x 10(4). The memristive device based on the WS2 NSs also exhibited the bipolar switching characteristics with low power consumption and great performance in the bent state with radii of the curvatures of 20 and 10 mm. Especially, the results obtained after bending the device were similar to those observed before bending. The device showed nearly the same ON/OFF ratio for a retention time of 1 x 10(4) sec, and the number of endurance cycles was greater than 1 x 10(2). The set voltage and the reset voltage probability distributions for the setting and the resetting processes indicated bipolar switching characteristics. The operating and the carrier transport mechanisms of the Al/WS2 NSs:PMMA/ITO device could be explained based on the current-voltage results with the aid of an energy band diagram.

Keyword:

Community:

  • [ 1 ] [Lee, Jeong Heon]Hanyang Univ, Dept Elect & Comp Engn, Seoul 04763, South Korea
  • [ 2 ] [Sung, Sihyun]Hanyang Univ, Dept Elect & Comp Engn, Seoul 04763, South Korea
  • [ 3 ] [An, Haoqun]Hanyang Univ, Dept Elect & Comp Engn, Seoul 04763, South Korea
  • [ 4 ] [Kim, Tae Whan]Hanyang Univ, Dept Elect & Comp Engn, Seoul 04763, South Korea
  • [ 5 ] [Wu, Chaoxing]Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350108, Fujian, Peoples R China

Reprint 's Address:

  • [Kim, Tae Whan]Hanyang Univ, Dept Elect & Comp Engn, Seoul 04763, South Korea

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Source :

SCIENTIFIC REPORTS

ISSN: 2045-2322

Year: 2019

Volume: 9

3 . 9 9 8

JCR@2019

3 . 8 0 0

JCR@2023

ESI Discipline: MULTIDISCIPLINARY;

ESI HC Threshold:283

JCR Journal Grade:1

CAS Journal Grade:3

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 4

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