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学者姓名：林杰文
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Abstract ：
由于将莫尔条纹图进行快速傅里叶变换时会导致频谱泄露，导致无法实现360°的全周精确测量，因此提出基于莫尔条纹的全周转角测量方法并搭建转角测量系统。以1°为步距，利用CMOS相机采集不同宽度的莫尔条纹图像，采用快速傅里叶变换（fast Fourier transform, FFT）对条纹进行处理，得到光栅频谱信息。同时采用汉宁窗能量重心校正算法（Hanning-window energy centrobaric method, HnWECM）校正频谱，得到莫尔条纹图像表征转角的真实有效信息，实现全周精确测量。实验结果表明，该系统可快速精准地实现转角的全周测量，测量范围广，最大误差率为0.243 3%。
Keyword ：
快速傅里叶变换 快速傅里叶变换 汉宁窗能量重心法 汉宁窗能量重心法 莫尔条纹 莫尔条纹 转角测量 转角测量
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| GB/T 7714 | 许令鸿 , 张秋坤 , 林杰文 et al. 基于莫尔条纹的全周转角精密测量方法 [J]. | 应用光学 , 2024 , 45 (03) : 644-651 . |
| MLA | 许令鸿 et al. "基于莫尔条纹的全周转角精密测量方法" . | 应用光学 45 . 03 (2024) : 644-651 . |
| APA | 许令鸿 , 张秋坤 , 林杰文 , 李劲林 , 黎昕婷 , 钟舜聪 . 基于莫尔条纹的全周转角精密测量方法 . | 应用光学 , 2024 , 45 (03) , 644-651 . |
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Abstract ：
A nonlinear chirp is always introduced to an interference fringe in the Fourier domain optical coherence tomography (FD-OCT), which can be regarded as an amplitude-modulated and frequency-modulated nonstationary signal. It is mainly caused by the non-uniform wavenumber sampling and the dispersion mismatch between the sample and the reference arms. It results in the broadening of the axial point spread function and the degradation of the axial resolution. In this paper, the parameterized instantaneous frequency estimation method (PIFEM) is applied to estimate the phase function of the chirped interference fringe to achieve the linear resampling of the wavenumber space and the rebalance of the dispersion mismatch. The proposed method is efficient and convenient that requires only two interference fringes corresponding to a mirror at different depths in the sample arm of the FD-OCT system. In addition, it is proved that the PIFEM is adapted to compensate for the depthindependent dispersion mismatch caused by the sample comprised of layered structures. The experiment results validate the performance of the proposed method.
Keyword ：
Dispersion compensation Dispersion compensation estimation estimation Optical coherence tomography Optical coherence tomography Parameterized instantaneous frequency Parameterized instantaneous frequency Wavenumber calibration Wavenumber calibration
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| GB/T 7714 | Huang, Yuexin , Deng, Yaosen , Lin, Jiewen et al. Wavenumber calibration and dispersion compensation for Fourier domain optical coherence tomography by parameterized instantaneous frequency estimation method [J]. | OPTICS AND LASER TECHNOLOGY , 2024 , 174 . |
| MLA | Huang, Yuexin et al. "Wavenumber calibration and dispersion compensation for Fourier domain optical coherence tomography by parameterized instantaneous frequency estimation method" . | OPTICS AND LASER TECHNOLOGY 174 (2024) . |
| APA | Huang, Yuexin , Deng, Yaosen , Lin, Jiewen , Zhang, Qiukun , Zhong, Shuncong . Wavenumber calibration and dispersion compensation for Fourier domain optical coherence tomography by parameterized instantaneous frequency estimation method . | OPTICS AND LASER TECHNOLOGY , 2024 , 174 . |
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Abstract ：
The flatness of semiconductor substrates is an important parameter for evaluating the surface quality of semiconductor substrates. However, existing technology cannot simultaneously achieve high measurement efficiency, large-range thickness measurement, and nanometer-level measurement accuracy in the thickness measurement of semiconductor substrates. To solve the problems, we propose to apply the method that combines spectral-domain optical coherence tomography (SD-OCT) with the Hanning-windowed energy centrobaric method (HnWECM) to measure the thickness of semiconductor substrates. The method can be employed in the full-chip thickness measurement of a sapphire substrate, which has a millimeter measuring range, nanometer-level precision, and a sampling rate that can reach up to 80 kHz. In this contribution, we measured the full-chip thickness map of a sapphire substrate by using this method and analyzed the machining characteristics. The measurement results of a high-precision mechanical thickness gauge, which is widely used for thickness measurement in the wafer fabrication process, were compared with the proposed method. The difference between these two methods is 0.373%, which explains the accuracy of the applied method to some extent. The results of 10 sets of repeatability experiments on 250 measurement points show that the maximum relative standard deviation (RSD) at this point is 0.0061%, and the maximum fluctuation is 71.0 nm. The above experimental results prove that this method can achieve the high-precision thickness measurement of the sapphire substrate and is of great significance for improving the surface quality detection level of semiconductor substrates.
Keyword ：
HnWECM HnWECM SD-OCT SD-OCT semiconductor substrate semiconductor substrate spectral-domain interferometry spectral-domain interferometry thickness measurement thickness measurement
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| GB/T 7714 | Zhong, Shuncong , He, Renyu , Deng, Yaosen et al. High-Precision Semiconductor Substrate Thickness Gauge Based on Spectral-Domain Interferometry [J]. | PHOTONICS , 2024 , 11 (5) . |
| MLA | Zhong, Shuncong et al. "High-Precision Semiconductor Substrate Thickness Gauge Based on Spectral-Domain Interferometry" . | PHOTONICS 11 . 5 (2024) . |
| APA | Zhong, Shuncong , He, Renyu , Deng, Yaosen , Lin, Jiewen , Zhang, Qiukun . High-Precision Semiconductor Substrate Thickness Gauge Based on Spectral-Domain Interferometry . | PHOTONICS , 2024 , 11 (5) . |
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Abstract ：
本实用新型涉及一种基于光学干涉的自润滑轴承涂层厚度检测装置，该装置包括：钨卤素灯光源模块，用于发射光束；第一凸透镜，用于将钨卤素灯光源模块的发射光准直为平行光束；迈克尔逊干涉仪模块，用于将光束分束为强度相等的两束光，作为参考光、探测光分别汇聚于参考镜、待测轴承涂层表面，反射后重合发生干涉，形成干涉光束；以及二维光谱仪模块，包括反射镜、反射式光栅、柱透镜和面阵CCD相机，干涉光束经反射镜传播至反射式光栅，并按波长在空间分光后由柱透镜汇聚成干涉谱线，由面阵CCD相机采集获得二维干涉光谱条纹。该装置有利于获取自润滑轴承涂层厚度的二维干涉条纹图像，进而实现对自润滑轴承涂层厚度进行非接触无损检测。
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| GB/T 7714 | 黄异 , 钟舜聪 , 陈志雄 et al. 一种基于光学干涉的自润滑轴承涂层厚度检测装置 : CN202221788563.8[P]. | 2022-07-12 00:00:00 . |
| MLA | 黄异 et al. "一种基于光学干涉的自润滑轴承涂层厚度检测装置" : CN202221788563.8. | 2022-07-12 00:00:00 . |
| APA | 黄异 , 钟舜聪 , 陈志雄 , 庄彩虹 , 林杰文 , 张秋坤 et al. 一种基于光学干涉的自润滑轴承涂层厚度检测装置 : CN202221788563.8. | 2022-07-12 00:00:00 . |
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