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author:

Liang, Q. (Liang, Q..) [1] | Zhu, M. (Zhu, M..) [2] | Ling, X. (Ling, X..) [3] | Yang, D. (Yang, D..) [4] | Jia, L. (Jia, L..) [5] | Li, T. (Li, T..) [6] | Xu, X. (Xu, X..) [7] | Zhang, H. (Zhang, H..) [8] | Lu, X. (Lu, X..) [9]

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Scopus

Abstract:

Ga2O3 is a transparent oxide dielectric material characterized by low loss, high refractive index, and excellent chemical and thermal stability, suggesting significant potential in other spectral bands beyond ultraviolet detector and power electronics, although few studies have been reported. Herein, we employ Ga2O3 as a dielectric layer to construct a metal-insulator-metal (MIM) symmetric metasurface absorber, which achieves nearly perfect absorption of 99% in the near-infrared band, and can achieve a maximum redshift of 1.009 lm to 1.349 lm by changing the parameters of the upper symmetric metal array. Additionally, If the symmetry of the metal array is broken, the Fano effect will be excited, generating multiple resonance peaks in the absorption spectrum, and more than 60% of the average bandwidth absorption will be achieved in the range from 0.844 lm to 1.130 lm by the superposition of multiple resonance peaks. More importantly, graphene is introduced into the asymmetric structure, resulting in a dynamic modulation of 0.334 lm by adjusting the Fermi energy of graphene, while the bandwidth absorption characteristics are retained. This work sheds valuable insight into the Ga2O3-based metasurface absorber, thereby paving the way for near-infrared optoelectronic devices. © 2013 IEEE.

Keyword:

Absorber Ga2O3 Graphene Metasurface Near-infrared optoelectronic

Community:

  • [ 1 ] [Liang Q.]Fuzhou University, FZU-Jinjiang Joint Institute of Microelectronics, Jinjiang Science and Education Park, Jinjiang, 362200, China
  • [ 2 ] [Zhu M.]Fuzhou University, FZU-Jinjiang Joint Institute of Microelectronics, Jinjiang Science and Education Park, Jinjiang, 362200, China
  • [ 3 ] [Zhu M.]Fuzhou University, College of Physics and Information Engineering, Fuzhou, 350108, China
  • [ 4 ] [Ling X.]Fuzhou University, FZU-Jinjiang Joint Institute of Microelectronics, Jinjiang Science and Education Park, Jinjiang, 362200, China
  • [ 5 ] [Yang D.]Fuzhou University, FZU-Jinjiang Joint Institute of Microelectronics, Jinjiang Science and Education Park, Jinjiang, 362200, China
  • [ 6 ] [Yang D.]Fuzhou University, College of Physics and Information Engineering, Fuzhou, 350108, China
  • [ 7 ] [Jia L.]Fuzhou University, FZU-Jinjiang Joint Institute of Microelectronics, Jinjiang Science and Education Park, Jinjiang, 362200, China
  • [ 8 ] [Jia L.]Fuzhou University, College of Physics and Information Engineering, Fuzhou, 350108, China
  • [ 9 ] [Li T.]Fuzhou University, FZU-Jinjiang Joint Institute of Microelectronics, Jinjiang Science and Education Park, Jinjiang, 362200, China
  • [ 10 ] [Li T.]Fuzhou University, College of Physics and Information Engineering, Fuzhou, 350108, China
  • [ 11 ] [Xu X.]Fuzhou University, FZU-Jinjiang Joint Institute of Microelectronics, Jinjiang Science and Education Park, Jinjiang, 362200, China
  • [ 12 ] [Xu X.]Fuzhou University, College of Physics and Information Engineering, Fuzhou, 350108, China
  • [ 13 ] [Zhang H.]Fuzhou University, FZU-Jinjiang Joint Institute of Microelectronics, Jinjiang Science and Education Park, Jinjiang, 362200, China
  • [ 14 ] [Zhang H.]Fuzhou University, College of Physics and Information Engineering, Fuzhou, 350108, China
  • [ 15 ] [Lu X.]Fuzhou University, FZU-Jinjiang Joint Institute of Microelectronics, Jinjiang Science and Education Park, Jinjiang, 362200, China
  • [ 16 ] [Lu X.]Fuzhou University, College of Physics and Information Engineering, Fuzhou, 350108, China

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Source :

IEEE Journal of the Electron Devices Society

ISSN: 2168-6734

Year: 2025

2 . 0 0 0

JCR@2023

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ESI Highly Cited Papers on the List: 0 Unfold All

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30 Days PV: 2

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