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author:

Ancang Yang (Ancang Yang.) [1] | Yaoping Lu (Yaoping Lu.) [2] | Yonghua Duan (Yonghua Duan.) [3] | Mengnie Li (Mengnie Li.) [4] | Shanju Zheng (Shanju Zheng.) [5] | Mingjun Peng (Mingjun Peng.) [6]

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Abstract:

The void defect in intermetallic compounds(IMCs)layer at the joints caused by inhomogeneous atomic diffusion is one of the most important factors limiting the further development of Sn-based solders.In this work,the thermodynamic stability of IMCs(high-temperature η-Cu6Sn5 and o-Cu3Sn phases)was improved by adding small amounts of indium(In),and the IMCs layers with moderate thickness,low defect concentrations and stable interface bonding were successfully obtained.The formation order of compounds and the interfacial orientation relationships in IMCs layers,the atomic diffusion mechanism,and the growth tuning mechanism of In on η-Cu6Sn5 and Cu3Sn,after In adding,were discussed com-prehensively by combining calculations and experiments.It is the first time that the classic heteroge-neous nucleation theory and CALPHAD data were used to obtain the critical nucleus radius of η-Cu6Sn5 and Cu3Sn,and to explain in detail the main factors affecting the formation order and location of IMCs at joints during the welding process.A novel and systematic growth model about IMCs layers in the case of doping with alloying elements was proposed.The growth tuning mechanism of In doping on η-Cu6Sn5 and Cu3Sn was further clarified based on the proposed model using first-principles calculations.The growth model used in this study can provide insights into the development and design of multiele-ment Sn-based solders.

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  • [ 1 ] [Yonghua Duan]昆明科技大学材料科学与工程学院
  • [ 2 ] [Shanju Zheng]昆明科技大学材料科学与工程学院
  • [ 3 ] [Mingjun Peng]昆明科技大学材料科学与工程学院
  • [ 4 ] [Mengnie Li]昆明科技大学材料科学与工程学院
  • [ 5 ] [Yaoping Lu]福州大学
  • [ 6 ] [Ancang Yang]昆明科技大学材料科学与工程学院

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材料科学技术(英文版)

ISSN: 1005-0302

CN: 21-1315/TG

Year: 2024

Issue: 15

Volume: 182

Page: 246-259

1 1 . 2 0 0

JCR@2023

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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