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author:

Chen, Hao-Biao (Chen, Hao-Biao.) [1] | Lin, Cheng (Lin, Cheng.) [2] | Lv, Yan-Ping (Lv, Yan-Ping.) [3] | Chen, Fu-Quan (Chen, Fu-Quan.) [4] (Scholars:陈福全)

Indexed by:

EI Scopus SCIE

Abstract:

Through a series of model tests accomplished by Particle Image Velocimetry analyses, this study presents the visualization of the displacement field of the narrow soil behind retaining structures under translational mode. The progressive development of failure mechanisms and active earth pressure are measured in the process of tests. Finite element limit analyses are supplementally carried out to investigate and verify the ultimate failure mechanism and active earth pressure acting on retaining structures as the tests. Furthermore, this study carried out parameter studies on the development of failure mechanisms and active earth pressure with different aspect ratios, inclinations of the existing structure, and backfill surface surcharge. Experimental and numerical results show a reasonable verification of each other. With the increase in backfill spacing, the failure mechanism of backfill turns from reflective shear bands into a single shear band, and the earth pressure exerted on the retaining structure increases.

Keyword:

Earth pressure Failure mechanism Model test Narrow backfill Retaining walls

Community:

  • [ 1 ] [Chen, Hao-Biao]Fuzhou Univ, Coll Civil Engn, Fuzhou, Peoples R China
  • [ 2 ] [Lv, Yan-Ping]Fuzhou Univ, Coll Civil Engn, Fuzhou, Peoples R China
  • [ 3 ] [Chen, Fu-Quan]Fuzhou Univ, Coll Civil Engn, Fuzhou, Peoples R China
  • [ 4 ] [Chen, Hao-Biao]Shanghai Jiao Tong Univ, Dept Civil Engn, Shanghai, Peoples R China
  • [ 5 ] [Lin, Cheng]States Grid Fujian Elect Power Co Construct Branch, Fuzhou, Peoples R China
  • [ 6 ] [Lv, Yan-Ping]Fuzhou Univ, Coll Civil Engn, 2 Xueyuan Rd, Fuzhou 350116, Peoples R China

Reprint 's Address:

  • 吕艳平

    [Lv, Yan-Ping]Fuzhou Univ, Coll Civil Engn, 2 Xueyuan Rd, Fuzhou 350116, Peoples R China

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Source :

INTERNATIONAL JOURNAL OF PHYSICAL MODELLING IN GEOTECHNICS

ISSN: 1346-213X

Year: 2024

Issue: 5

Volume: 24

Page: 250-267

1 . 2 0 0

JCR@2023

CAS Journal Grade:4

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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