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Highly stable and patterned silver nanowire (AgNW) networks are essential and challenging for flexible or wearable electronics. In this work, TiO2 coatings by atomic layer deposition (ALD) technique were introduced for the fabrication of highly stable and patterned AgNW/TiO2 composites for flexible transparent conductive electrodes (TCEs). It was found that TiO2 coating could not only enhance the adhesion of AgNWs to the substrate, but also improve the flexibility of AgNW networks. This phenomenon was owed to the stability enhancement by the three-dimensional conformal deposition of TiO2 coatings. What’s more, the thermal and oxidation stabilities of AgNW networks could be greatly improved because of the barrier performance of TiO2 coating layer. Based on the stability enhancement by TiO2 coatings, a novelty patterning method of the AgNW networks was implemented by cooperating with photolithography and ultrasonic concussion process. AgNW networks with the strip width of 200 μm were well patterned without defects. Finally, highly stable and patterned AgNW/TiO2 composites were applied as flexible TCEs for alternating current electroluminescent (ACEL) devices. The whole ACEL device showed a high transparency of around 40%, and the flexibility and the lifetime of ACEL devices were correspondingly improved owe to the enhancement by TiO2 coatings. These results indicated the prospects of the AgNW/TiO2 composites on the applications to flexible or wearable electronics. Graphical abstract: TiO2 coatings by atomic layer deposition (ALD) technique were introduced for the fabrication of highly stable and patterned AgNW/TiO2 composites for flexible transparent conductive electrodes (TCEs). [Figure not available: see fulltext.]. © 2023, The Author(s), under exclusive licence to Springer Science+Business Media, LLC, part of Springer Nature.
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Journal of Materials Science
ISSN: 0022-2461
Year: 2023
Issue: 47
Volume: 58
Page: 17816-17828
3 . 5
JCR@2023
3 . 5 0 0
JCR@2023
JCR Journal Grade:2
CAS Journal Grade:3
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WoS CC Cited Count: 0
SCOPUS Cited Count:
ESI Highly Cited Papers on the List: 0 Unfold All
WanFang Cited Count:
Chinese Cited Count:
30 Days PV: 1
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