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author:

Ruipeng Hou (Ruipeng Hou.) [1] | Hui Li (Hui Li.) [2] | Mengjuan Diao (Mengjuan Diao.) [3] | Yanhui Sun (Yanhui Sun.) [4] | Ying Liang (Ying Liang.) [5] | Zhiyang Yu (Zhiyang Yu.) [6] (Scholars:喻志阳) | Zhipeng Huang (Zhipeng Huang.) [7] | Chi Zhang (Chi Zhang.) [8]

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Abstract:

The on-demand modulation of defects in materials for the effective modulation of optical nonlinearity is desirable,while it remains a great challenge.In this work,we demonstrate that electrochemical activation is a facile and convenient approach to modulating the broadband third-order nonlinear absorption of nanoporous tungsten oxide(WO3-x)thin film.The film does not exhibit optical nonlinearity at the initial state,while shows a distinct saturable absorption under an applied voltage of-2.5 V with the excitation of 515,800,and 1,030 nm laser.The nonlinear absorption coefficient(βeff)is-766.38±6.67 cm·GW-1 for 1,030 nm laser,-624.24±17.15 cm·GW-1 for 800 nm laser,and-120.70±11.49 cm·GW-1 for 515 nm laser,and the performance is competitive among inorganic saturable absorbers.The activation is accomplished in 2 min.The performance enhancement is ascribed to the formation of abundant in-gap defect states because of the reduction of the tungsten atoms,and a Pauli-blocking effect occurs during the excitation of in-gap defect states.The small feature size of WO3-x(-12 nm)enables the effective and fast introduction and removal of the defects in porous film,and accordingly the fast and broadband modulation of optical nonlinearity.Our results suggest a controllable,effective,and convenient approach to tuning the nonlinear absorption of materials.

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Community:

  • [ 1 ] [Chi Zhang]同济大学
  • [ 2 ] [Ruipeng Hou]同济大学
  • [ 3 ] [Zhipeng Huang]同济大学
  • [ 4 ] [Yanhui Sun]同济大学
  • [ 5 ] [Ying Liang]同济大学
  • [ 6 ] [Zhiyang Yu]福州大学
  • [ 7 ] [Mengjuan Diao]同济大学
  • [ 8 ] [Hui Li]同济大学

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Source :

纳米研究(英文版)

ISSN: 1998-0124

CN: 11-5974/O4

Year: 2022

Issue: 1

Volume: 15

Page: 326-332

9 . 9

JCR@2022

9 . 6 0 0

JCR@2023

ESI Discipline: PHYSICS;

ESI HC Threshold:55

JCR Journal Grade:1

CAS Journal Grade:1

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count: -1

Chinese Cited Count:

30 Days PV: 1

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