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author:

Gao, H. (Gao, H..) [1] | Qie, Y. (Qie, Y..) [2] | Zhao, H. (Zhao, H..) [3] | Li, F. (Li, F..) [4] | Guo, T. (Guo, T..) [5] | Hu, H. (Hu, H..) [6]

Indexed by:

Scopus

Abstract:

We report here high-efficiency, high-resolution quantum dot (QD) light-emitting diodes patterned by ultraviolet-induced ligand exchange. A ligand passivation strategy is carried out to remove the surface defects of QDs after patterning, and thus the device efficiency shows more than 3-fold increase. Moreover, in order to reduce the leakage current occurring in the non-luminance area between QD arrays, a polymethyl methacrylate film is inserted as a charge barrier layer to separate the hole- and electron-transport layers from direct contact. As a result, the leakage current of the devices is effectively decreased. By optimizing the ligand passivation and synergistically suppressing the leakage current, the device with 5-μm diameter QD arrays exhibits luminance over 125000 cd/m2 and maximum external quantum efficiency of 10.5%. This work provides a feasible way to achieving high resolution, high-performance quantum dot light-emitting diodes for next-generation display applications. © 2022 Elsevier B.V.

Keyword:

High-performance Ligand exchange Passivation Quantum dot light-emitting diodes

Community:

  • [ 1 ] [Gao, H.]Institute of Optoelectronic Technology, Fuzhou University, Fuzhou, 350108, China
  • [ 2 ] [Qie, Y.]Institute of Optoelectronic Technology, Fuzhou University, Fuzhou, 350108, China
  • [ 3 ] [Zhao, H.]Institute of Optoelectronic Technology, Fuzhou University, Fuzhou, 350108, China
  • [ 4 ] [Li, F.]Institute of Optoelectronic Technology, Fuzhou University, Fuzhou, 350108, China
  • [ 5 ] [Li, F.]Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, 350108, China
  • [ 6 ] [Guo, T.]Institute of Optoelectronic Technology, Fuzhou University, Fuzhou, 350108, China
  • [ 7 ] [Guo, T.]Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, 350108, China
  • [ 8 ] [Hu, H.]Institute of Optoelectronic Technology, Fuzhou University, Fuzhou, 350108, China
  • [ 9 ] [Hu, H.]Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, 350108, China

Reprint 's Address:

  • [Hu, H.]Institute of Optoelectronic Technology, China

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Source :

Organic Electronics

ISSN: 1566-1199

Year: 2022

Volume: 108

3 . 2

JCR@2022

2 . 7 0 0

JCR@2023

ESI HC Threshold:55

JCR Journal Grade:2

CAS Journal Grade:3

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count: 14

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 2

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