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author:

Sa, Baisheng (Sa, Baisheng.) [1] (Scholars:萨百晟) | Shen, Xiaotian (Shen, Xiaotian.) [2] | Cai, Shuchang (Cai, Shuchang.) [3] | Cui, Zhou (Cui, Zhou.) [4] | Xiong, Rui (Xiong, Rui.) [5] | Xu, Chao (Xu, Chao.) [6] | Wen, Cuilian (Wen, Cuilian.) [7] (Scholars:温翠莲) | Wu, Bo (Wu, Bo.) [8] (Scholars:吴波)

Indexed by:

EI SCIE

Abstract:

Two-dimensional chalcogenides could play an important role in solving the short channel effect and extending Moore's law in the post-Moore era due to their excellent performances in the spintronics and optoelectronics fields. In this paper, based on theoretical calculations combining density functional theory and non-equilibrium Green's function, we have systematically explored the intrinsic mobility in the Ga2SSe monolayer and quantum transport properties of sub-10 nm Ga2SSe field-effect transistors (FET). Interestingly, the Ga2SSe monolayer presents high intrinsic electron mobility up to 10(4) cm(2) (V s)(-1). It is highlighted that the intrinsic mobility in the Ga2SSe monolayer is significantly restrained by phonon scattering, where the out-of-plane acoustic mode and high-frequency optic phonon mode are found predominantly coupled with the electrons. As a result, the n-type doping sub-10 nm Ga2SSe FETs represent distinguished transport properties. In particular, even the gate length is shortened to 3 nm, the on-state current, delay time and power consumption of the n-type doping Ga2SSe FET along the armchair direction can reach the International Technology Roadmap for Semiconductor industry standards for high-performance requirements. Our present study paves the way for the application of Ga2SSe monolayers in ultra-small sized FETs in the post-silicon era.

Keyword:

Community:

  • [ 1 ] [Sa, Baisheng]Fuzhou Univ, Coll Mat Sci & Engn, Multiscale Computat Mat Facil, Fuzhou 350108, Peoples R China
  • [ 2 ] [Shen, Xiaotian]Fuzhou Univ, Coll Mat Sci & Engn, Multiscale Computat Mat Facil, Fuzhou 350108, Peoples R China
  • [ 3 ] [Cai, Shuchang]Fuzhou Univ, Coll Mat Sci & Engn, Multiscale Computat Mat Facil, Fuzhou 350108, Peoples R China
  • [ 4 ] [Cui, Zhou]Fuzhou Univ, Coll Mat Sci & Engn, Multiscale Computat Mat Facil, Fuzhou 350108, Peoples R China
  • [ 5 ] [Xiong, Rui]Fuzhou Univ, Coll Mat Sci & Engn, Multiscale Computat Mat Facil, Fuzhou 350108, Peoples R China
  • [ 6 ] [Wen, Cuilian]Fuzhou Univ, Coll Mat Sci & Engn, Multiscale Computat Mat Facil, Fuzhou 350108, Peoples R China
  • [ 7 ] [Wu, Bo]Fuzhou Univ, Coll Mat Sci & Engn, Multiscale Computat Mat Facil, Fuzhou 350108, Peoples R China
  • [ 8 ] [Sa, Baisheng]Fuzhou Univ, Coll Mat Sci & Engn, Key Lab Ecomat Adv Technol, Fuzhou 350108, Peoples R China
  • [ 9 ] [Shen, Xiaotian]Fuzhou Univ, Coll Mat Sci & Engn, Key Lab Ecomat Adv Technol, Fuzhou 350108, Peoples R China
  • [ 10 ] [Cai, Shuchang]Fuzhou Univ, Coll Mat Sci & Engn, Key Lab Ecomat Adv Technol, Fuzhou 350108, Peoples R China
  • [ 11 ] [Cui, Zhou]Fuzhou Univ, Coll Mat Sci & Engn, Key Lab Ecomat Adv Technol, Fuzhou 350108, Peoples R China
  • [ 12 ] [Xiong, Rui]Fuzhou Univ, Coll Mat Sci & Engn, Key Lab Ecomat Adv Technol, Fuzhou 350108, Peoples R China
  • [ 13 ] [Wen, Cuilian]Fuzhou Univ, Coll Mat Sci & Engn, Key Lab Ecomat Adv Technol, Fuzhou 350108, Peoples R China
  • [ 14 ] [Wu, Bo]Fuzhou Univ, Coll Mat Sci & Engn, Key Lab Ecomat Adv Technol, Fuzhou 350108, Peoples R China
  • [ 15 ] [Xu, Chao]Xiamen Talentmats New Mat Sci & Technol Co Ltd, Xiamen 361015, Peoples R China

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Source :

PHYSICAL CHEMISTRY CHEMICAL PHYSICS

ISSN: 1463-9076

Year: 2022

Issue: 25

Volume: 24

Page: 15376-15388

3 . 3

JCR@2022

2 . 9 0 0

JCR@2023

ESI Discipline: CHEMISTRY;

ESI HC Threshold:74

JCR Journal Grade:2

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count: 7

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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