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author:

Zhuang, Wei (Zhuang, Wei.) [1] | Shi, Cheng (Shi, Cheng.) [2] | Zhang, Yu (Zhang, Yu.) [3] | Zhao, Chunlin (Zhao, Chunlin.) [4] | Lin, Tengfei (Lin, Tengfei.) [5] | Wu, Xiao (Wu, Xiao.) [6] | Lin, Cong (Lin, Cong.) [7] | Gao, Min (Gao, Min.) [8]

Indexed by:

EI

Abstract:

Flexible antiferroelectric (AFE) thin film capacitors are important for foldable and wearable electronics. This work demonstrates a direct epitaxial lift-off method to fabricate flexible epitaxial AFE thin film capacitors using (Pb0.98,La0.02)(Zr0.95,Ti0.05)O3 (PLZT) as an example. The flexible PLZT thin film showed the tetragonal structure with coexisting ferroelectricity and antiferroelectricity. An energy storage density (ESD) of 2.6 J/cm3 with an efficiency of 73% was obtained at the low electric field, and a high ESD of 22 J/cm3 with an efficiency of 33% was achieved at the high electric field. Such energy storage performances could be maintained after 103 bending cycles and 105 charging/discharging cycles. This simple method can be used to compose flexible epitaxial thin film capacitors and even other flexible thin film devices. © 2022

Keyword:

Antiferroelectricity Electric fields Energy storage Flexible electronics Lanthanum compounds Lead compounds Thin film circuits Thin films

Community:

  • [ 1 ] [Zhuang, Wei]College of Materials Science and Engineering, Fuzhou University, Fuzhou; 350108, China
  • [ 2 ] [Shi, Cheng]College of Materials Science and Engineering, Fuzhou University, Fuzhou; 350108, China
  • [ 3 ] [Zhang, Yu]College of Materials Science and Engineering, Fuzhou University, Fuzhou; 350108, China
  • [ 4 ] [Zhao, Chunlin]College of Materials Science and Engineering, Fuzhou University, Fuzhou; 350108, China
  • [ 5 ] [Lin, Tengfei]College of Materials Science and Engineering, Fuzhou University, Fuzhou; 350108, China
  • [ 6 ] [Wu, Xiao]College of Materials Science and Engineering, Fuzhou University, Fuzhou; 350108, China
  • [ 7 ] [Lin, Cong]College of Materials Science and Engineering, Fuzhou University, Fuzhou; 350108, China
  • [ 8 ] [Gao, Min]College of Materials Science and Engineering, Fuzhou University, Fuzhou; 350108, China

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Source :

Thin Solid Films

ISSN: 0040-6090

Year: 2022

Volume: 751

2 . 1

JCR@2022

2 . 0 0 0

JCR@2023

ESI HC Threshold:91

JCR Journal Grade:3

CAS Journal Grade:3

Cited Count:

WoS CC Cited Count: 0

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 3

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