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author:

Dong, Yibo (Dong, Yibo.) [1] | Xie, Yiyang (Xie, Yiyang.) [2] | Hu, Liangchen (Hu, Liangchen.) [3] | Xu, Chen (Xu, Chen.) [4] | Guo, Weiling (Guo, Weiling.) [5] | Pan, Guanzhong (Pan, Guanzhong.) [6] | Wang, Qiuhua (Wang, Qiuhua.) [7] | Qian, Fengsong (Qian, Fengsong.) [8] | Sun, Jie (Sun, Jie.) [9]

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EI

Abstract:

Surface plasmon resonance (SPR) of metal nanostructures has broad application prospects in the fields of sensing, energy, catalysis and optics. This paper reports a graphene-assisted method for preparing large-scale single-crystal Ag(111) nanoparticle (NP) arrays based on the ion implantation technique. By surface periodic patterning treatment and annealing of the implanted sample, regularly arranged Ag NPs can be prepared on the sample surface. A new application for graphene is proposed, that is, as a perfect barrier layer to prevent metal atoms from evaporating or diffusing. All the Ag NPs show (111) crystal orientation. Besides, the Ag atoms are covered by graphene immediately when they precipitate from the substrate, which can prevent them from being oxidized. On the basis of this structure, as one of the applications of the metal SPR, we have measured the surface-enhanced Raman scattering effect and found that the G peak of the Raman spectrum of the graphene achieved about 20 times enhancement. © 2020 IOP Publishing Ltd Printed in the UK

Keyword:

Crystal orientation Graphene Nanoparticles Plasmons Raman scattering Silver compounds Single crystals Substrates Surface plasmon resonance Surface scattering Surface treatment

Community:

  • [ 1 ] [Dong, Yibo]Key Laboratory of Optoelectronics Technology, College of Microelectronics, Beijing University of Technology, Beijing; 100124, China
  • [ 2 ] [Dong, Yibo]Centre for Artificial-Intelligence Nanophotonics, School of Optical-Electrical and ComputerEngineering, University of Shanghai for Science and Technology, Shanghai; 200093, China
  • [ 3 ] [Xie, Yiyang]Key Laboratory of Optoelectronics Technology, College of Microelectronics, Beijing University of Technology, Beijing; 100124, China
  • [ 4 ] [Hu, Liangchen]Key Laboratory of Optoelectronics Technology, College of Microelectronics, Beijing University of Technology, Beijing; 100124, China
  • [ 5 ] [Xu, Chen]Key Laboratory of Optoelectronics Technology, College of Microelectronics, Beijing University of Technology, Beijing; 100124, China
  • [ 6 ] [Guo, Weiling]Key Laboratory of Optoelectronics Technology, College of Microelectronics, Beijing University of Technology, Beijing; 100124, China
  • [ 7 ] [Pan, Guanzhong]Key Laboratory of Optoelectronics Technology, College of Microelectronics, Beijing University of Technology, Beijing; 100124, China
  • [ 8 ] [Wang, Qiuhua]Key Laboratory of Optoelectronics Technology, College of Microelectronics, Beijing University of Technology, Beijing; 100124, China
  • [ 9 ] [Qian, Fengsong]Key Laboratory of Optoelectronics Technology, College of Microelectronics, Beijing University of Technology, Beijing; 100124, China
  • [ 10 ] [Sun, Jie]Key Laboratory of Optoelectronics Technology, College of Microelectronics, Beijing University of Technology, Beijing; 100124, China
  • [ 11 ] [Sun, Jie]Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China, andNational and Local United Engineering Laboratory of Flat Panel Display Technology, Fuzhou University, Fuzhou; 350100, China

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Source :

Nanotechnology

ISSN: 0957-4484

Year: 2021

Issue: 2

Volume: 32

3 . 9 5 3

JCR@2021

2 . 9 0 0

JCR@2023

ESI HC Threshold:142

JCR Journal Grade:2

CAS Journal Grade:3

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count: 2

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 4

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