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author:

Diao, Mengjuan (Diao, Mengjuan.) [1] | Li, Hui (Li, Hui.) [2] | Sun, Yanhui (Sun, Yanhui.) [3] | Liang, Ying (Liang, Ying.) [4] | Yu, Zhiyang (Yu, Zhiyang.) [5] (Scholars:喻志阳) | Boukhvalov, Danil W. (Boukhvalov, Danil W..) [6] | Huang, Zhipeng (Huang, Zhipeng.) [7] | Zhang, Chi (Zhang, Chi.) [8]

Indexed by:

EI SCIE

Abstract:

The knowledge concerning the influence of defects on the nonlinear optical response of materials remains scarce so far. In this work, we have successfully introduced defects into SnS2 nanosheets by plasma treatment and shown that a defect generation is an effective approach to significantly improve the reverse saturable absorption of SnS2. The SnS2 nanosheets treated with Ar plasma for 40 s exhibit a nonlinear absorption coefficient (beta(0)) as large as (2.9 +/- 0.12) X 10(4) cm GW(-1), which is nearly 9 times that of the untreated sample. The influence of Ar-plasma-treatment time, defect type, and defect number on the nonlinear absorption of SnS2 nanosheets are also studied. Structure and spectroscopy characterization confirms the introduction of S and Sn vacancies with Ar-plasma etching. Surface photovoltage spectroscopy and density functional theory calculation indicate that S vacancies can induce in-gap states in the band gap. These in-gap states act as intermediate states for the successive absorption of photons during femtosecond laser excitation (namely, excited-state absorption). In contrast, Sn defects cannot lead to in-gap states and have a limited contribution to nonlinear absorption. Our result would provide a promising way to improve optical nonlinearities.

Keyword:

defect nonlinear optics reverse saturable sulfur vacancies tin sulfide

Community:

  • [ 1 ] [Diao, Mengjuan]Tongji Univ, Sch Chem Sci & Engn, Shanghai 200092, Peoples R China
  • [ 2 ] [Li, Hui]Tongji Univ, Sch Chem Sci & Engn, Shanghai 200092, Peoples R China
  • [ 3 ] [Sun, Yanhui]Tongji Univ, Sch Chem Sci & Engn, Shanghai 200092, Peoples R China
  • [ 4 ] [Liang, Ying]Tongji Univ, Sch Chem Sci & Engn, Shanghai 200092, Peoples R China
  • [ 5 ] [Huang, Zhipeng]Tongji Univ, Sch Chem Sci & Engn, Shanghai 200092, Peoples R China
  • [ 6 ] [Zhang, Chi]Tongji Univ, Sch Chem Sci & Engn, Shanghai 200092, Peoples R China
  • [ 7 ] [Yu, Zhiyang]Fuzhou Univ, Coll Chem, State Key Lab Photocatalysis Energy & Environm, Fuzhou 350002, Peoples R China
  • [ 8 ] [Boukhvalov, Danil W.]Nanjing Forestry Univ, Coll Sci, Jiangsu Coinnovat Ctr Efficient Proc & Utilizat F, Nanjing 210037, Peoples R China
  • [ 9 ] [Boukhvalov, Danil W.]Ural Fed Univ, Inst Phys & Technol, Ekaterinburg 620002, Russia

Reprint 's Address:

  • [Huang, Zhipeng]Tongji Univ, Sch Chem Sci & Engn, Shanghai 200092, Peoples R China;;[Zhang, Chi]Tongji Univ, Sch Chem Sci & Engn, Shanghai 200092, Peoples R China

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Related Keywords:

Source :

ACS APPLIED MATERIALS & INTERFACES

ISSN: 1944-8244

Year: 2021

Issue: 3

Volume: 13

Page: 4211-4219

1 0 . 3 8 3

JCR@2021

8 . 5 0 0

JCR@2023

ESI Discipline: MATERIALS SCIENCE;

ESI HC Threshold:142

JCR Journal Grade:1

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count: 16

SCOPUS Cited Count: 16

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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