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author:

马海峰 (马海峰.) [1] | 程贤甦 (程贤甦.) [2] (Scholars:程贤甦) | 林俊鸿 (林俊鸿.) [3]

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Abstract:

采用化学氧化聚合法在铝箔上原位聚合聚吡咯阴极层,研究了不同氧化剂、4-硝基酞酸加入方式对聚吡咯电容器性能的影响.结果表明:添加4-硝基酞酸明显降低了电容器的漏电流,制备出tan δ为0.012(100 Hz),IL小于0.8 μA,且具有良好频率特性的固体片式铝电解电容器.

Keyword:

化学聚合 固体铝电解电容器 漏电流 电子技术 聚吡咯

Community:

  • [ 1 ] [马海峰]福州大学
  • [ 2 ] [程贤甦]福州大学
  • [ 3 ] [林俊鸿]福州大学

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Source :

电子元件与材料

ISSN: 1001-2028

CN: 51-1241/TN

Year: 2007

Issue: 7

Volume: 26

Page: 38-41

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 4

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