Indexed by:
Abstract:
采用化学氧化聚合法在铝箔上原位聚合聚吡咯阴极层,研究了不同氧化剂、4-硝基酞酸加入方式对聚吡咯电容器性能的影响.结果表明:添加4-硝基酞酸明显降低了电容器的漏电流,制备出tan δ为0.012(100 Hz),IL小于0.8 μA,且具有良好频率特性的固体片式铝电解电容器.
Keyword:
Reprint 's Address:
Email:
Version:
Source :
电子元件与材料
ISSN: 1001-2028
CN: 51-1241/TN
Year: 2007
Issue: 7
Volume: 26
Page: 38-41
Cited Count:
SCOPUS Cited Count:
ESI Highly Cited Papers on the List: 0 Unfold All
WanFang Cited Count:
Chinese Cited Count:
30 Days PV: 4
Affiliated Colleges: