Indexed by:
Abstract:
通过直流与脉冲电沉积分别制备平均晶粒度为20~30 nm,宽晶粒度分布(5~120 nm)的纳米镍.在室温静拉伸应变速率范围内,直流电沉积制备的纳米镍的平均抗拉强度和平均断裂延伸率分别为1176 MPa与10.6%.而由脉冲电沉积技术制备的纳米镍抗拉强度可达1500 MPa之上,最高断裂延伸率可达13.3%.与电沉积获得的普通窄晶粒度分布的纳米镍相比,宽晶粒度分布的纳米镍的塑性要高出100%以上.其原因是大型晶粒内部允许位错的存在,且理论计算表明,晶内位错可通过Frank-Read源机制进行增殖.
Keyword:
Reprint 's Address:
Email:
Version:
Source :
稀有金属材料与工程
ISSN: 1002-185X
CN: 61-1154/TG
Year: 2009
Issue: 12
Volume: 38
Page: 2075-2079
0 . 1 6 1
JCR@2009
0 . 6 0 0
JCR@2023
ESI Discipline: MATERIALS SCIENCE;
JCR Journal Grade:4
Cited Count:
WoS CC Cited Count: 0
SCOPUS Cited Count:
ESI Highly Cited Papers on the List: 0 Unfold All
WanFang Cited Count: -1
Chinese Cited Count:
30 Days PV: 13
Affiliated Colleges: