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author:

Wang, S.-B. (Wang, S.-B..) [1] | Lei, G.J. (Lei, G.J..) [2] | Li, M. (Li, M..) [3] | Yu, L.M. (Yu, L.M..) [4] | Bu, Y.N. (Bu, Y.N..) [5] | Ni, W.Y. (Ni, W.Y..) [6] | Liu, L. (Liu, L..) [7] | Liu, D.P. (Liu, D.P..) [8] | Yang, S.Z. (Yang, S.Z..) [9]

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Scopus

Abstract:

In high-power RF ion source, three different regions of the Hβ and Hγ intensities in the Balmer series of spectral lines for atomic hydrogen plasma were investigated. Three different regions of the Hβ and Hγ intensities were detected by the increase of input power (0-6 kW) at ICP. In hydrogen plasma spectrum, the Hβ and Hγ intensities showed three processes: slowly increase, quickly increase and stable saturation. The Stark effect in strong electrical field plays a crucial role in dominating the Balmer Hβ and Hγ emissions from high-density RF plasma. © (2013) Trans Tech Publications, Switzerland.

Keyword:

Balmer Hβ and Hγ; Emissions; High-density hydrogen plasmas; NBI; RF discharge; Stark effect

Community:

  • [ 1 ] [Wang, S.-B.]College of Physics and Information Engineering, Fuzhou University, 350108, China
  • [ 2 ] [Wang, S.-B.]School of Physics and Mechanical and Electrical Engineering, Xiamen University, 361005, China
  • [ 3 ] [Lei, G.J.]Southwestern Institute of Physics, Chengdu, 610041, China
  • [ 4 ] [Li, M.]Southwestern Institute of Physics, Chengdu, 610041, China
  • [ 5 ] [Yu, L.M.]Southwestern Institute of Physics, Chengdu, 610041, China
  • [ 6 ] [Bu, Y.N.]Southwestern Institute of Physics, Chengdu, 610041, China
  • [ 7 ] [Ni, W.Y.]Southwestern Institute of Physics, Chengdu, 610041, China
  • [ 8 ] [Liu, L.]Southwestern Institute of Physics, Chengdu, 610041, China
  • [ 9 ] [Liu, D.P.]School of Physics and Mechanical and Electrical Engineering, Xiamen University, 361005, China
  • [ 10 ] [Yang, S.Z.]School of Physics and Mechanical and Electrical Engineering, Xiamen University, 361005, China

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Source :

Advanced Materials Research

ISSN: 1022-6680

Year: 2013

Volume: 774-776

Page: 471-478

Language: English

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count: 1

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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